| Literature DB >> 29711364 |
Franz Effenberger1, Günther Götz1, Bernd Bidlingmaier1, Markus Wezstein1.
Abstract
Direct lateral patterning in the formation of self-assembled monolayers (SAMs) on silicon was achieved by the photoinduced reaction of aldehydes with Si(111)-H surfaces by using the usual masking techniques (see the schematic illustration; on the right-hand side is a microscopy image of a patterned SAM formed from octadecanal). © 1998 WILEY-VCH Verlag GmbH, Weinheim, Fed. Rep. of Germany.Entities:
Keywords: Monolayers; Photochemistry; Self-assembly; Silicon
Year: 1998 PMID: 29711364 DOI: 10.1002/(SICI)1521-3773(19981002)37:18<2462::AID-ANIE2462>3.0.CO;2-R
Source DB: PubMed Journal: Angew Chem Int Ed Engl ISSN: 1433-7851 Impact factor: 15.336