Literature DB >> 29632415

The role of hydrophobic silane coating on Si stamps in nanoimprint lithography.

Alborz Amirsadeghi1, Lance Brumfield1, Junseo Choi1, Emily Brown1, Jae Jong Lee2, Sunggook Park1.   

Abstract

Hydrophobic silane coatings have been successfully applied to the surface of Si stamps to improve demolding in nanoimprint lithography (NIL). However, the role of the silane coating has only been studied either indirectly, by measuring adhesion or friction coefficients for Si and substrate surfaces without patterns, or collectively, by measuring the overall demolding force that does not differentiate contributions of friction dissipation, stored elastic energy, and adhesion. Here, for the first time, we present experimental evidence on the role of the silane coating in improving demolding in UV-NIL by using different silane coatings. The silane coatings were characterized by x-ray photoelectron spectroscopy, water contact angle, and friction force measurements. Then, the work of demolding was systematically measured for different silane coatings using stamps with the same micropattern but different pattern depths. Comparison of the results to the theoretical model developed for fiber-matrix debonding energy by Sutcu and Hillig [Acta Metall. Mater. 38(12), 2653-2662] indicated that with a hydrophobic silane coating, the main parameter contributing to overall demolding work shifts from adhesion to stored elastic energy and frictional dissipation as surface adhesion keeps decreasing. The results confirm that the main role of the silane coating in reducing the demolding is to reduce surface adhesion rather than friction at the stamp/substrate interface.

Entities:  

Year:  2017        PMID: 29632415      PMCID: PMC5881421          DOI: 10.1063/1.4974533

Source DB:  PubMed          Journal:  J Appl Phys        ISSN: 0021-8979            Impact factor:   2.546


  6 in total

1.  A simulation study on the effect of cross-linking agent concentration for defect tolerant demolding in UV nanoimprint lithography.

Authors:  Alborz Amirsadeghi; Jae Jong Lee; Sunggook Park
Journal:  Langmuir       Date:  2012-07-23       Impact factor: 3.882

2.  Simulation and investigation of factors affecting high aspect ratio UV embossing.

Authors:  Mary B Chan-Park; Y C Lam; P Laulia; S C Joshi
Journal:  Langmuir       Date:  2005-03-01       Impact factor: 3.882

3.  Complete plastic nanofluidic devices for DNA analysis via direct imprinting with polymer stamps.

Authors:  Jiahao Wu; Rattikan Chantiwas; Alborz Amirsadeghi; Steven A Soper; Sunggook Park
Journal:  Lab Chip       Date:  2011-07-22       Impact factor: 6.799

Review 4.  Surface free energy of a solid from contact angle hysteresis.

Authors:  Emil Chibowski
Journal:  Adv Colloid Interface Sci       Date:  2003-04-25       Impact factor: 12.984

5.  Polybenzoxazine as a mold-release agent for nanoimprint lithography.

Authors:  Chih-Feng Wang; Shih-Feng Chiou; Fu-Hsiang Ko; Jem-Kun Chen; Cheng-Tung Chou; Chih-Feng Huang; Shiao-Wei Kuo; Feng-Chih Chang
Journal:  Langmuir       Date:  2007-04-26       Impact factor: 3.882

6.  Adhesion force measurement between the stamp and the resin in ultraviolet nanoimprint lithography--an investigative approach.

Authors:  Jayakumar Perumal; Tae Ho Yoon; Hwan Soo Jang; Jae Jong Lee; Dong Pyo Kim
Journal:  Nanotechnology       Date:  2009-01-12       Impact factor: 3.874

  6 in total
  1 in total

1.  Effect of Interfacial Interaction on the Demolding Deformation of Injection Molded Microfluidic Chips.

Authors:  Yilei Wang; Can Weng; Huijie Sun; Zijian Deng; Bingyan Jiang
Journal:  Nanomaterials (Basel)       Date:  2022-09-29       Impact factor: 5.719

  1 in total

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