Literature DB >> 29509395

Recent Advances of Solution-Processed Metal Oxide Thin-Film Transistors.

Wangying Xu1, Hao Li2, Jian-Bin Xu2, Lei Wang2,3.   

Abstract

Solution-processed metal oxide thin-film transistors (TFTs) are considered as one of the most promising transistor technologies for future large-area flexible electronics. This work surveys the recent advances in solution-processed metal oxide TFTs, including n-type oxide semiconductors, oxide dielectrics, and p-type oxide semiconductors. We first deliver a review on the history and present status of metal oxide TFTs. Then, we present the recent progress in solution-processed n-type oxide semiconductors, with a special focus on low-temperature and large-area solution-based approaches as well as emerging nondisplay applications. Next, we give a detailed analysis of the state-of-the-art solution-processed oxide dielectrics for low-power electronics. We further discuss the recent advances in solution-based p-type oxide semiconductors, which will enable the highly desirable future low-cost large-area complementary circuits. Finally, we draw conclusions and outline the perspectives over the research field.

Entities:  

Keywords:  low-temperature; metal oxide TFTs; n-type oxide semiconductors; oxide dielectrics; p-type oxide semiconductors; solution-processed

Year:  2018        PMID: 29509395     DOI: 10.1021/acsami.7b16010

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  9 in total

1.  Low temperature atomic layer deposition of zirconium oxide for inkjet printed transistor applications.

Authors:  Mohi Uddin Jewel; Md Shamim Mahmud; Mahmuda Akter Monne; Alex Zakhidov; Maggie Yihong Chen
Journal:  RSC Adv       Date:  2019-01-15       Impact factor: 3.361

2.  Highly Transparent and Surface-Plasmon-Enhanced Visible-Photodetector Based on Zinc Oxide Thin-Film Transistors with Heterojunction Structure.

Authors:  Cheng-Jyun Wang; Hsin-Chiang You; Kuan Lin; Jen-Hung Ou; Keng-Hsien Chao; Fu-Hsiang Ko
Journal:  Materials (Basel)       Date:  2019-11-05       Impact factor: 3.623

3.  Low-Temperature and UV Irradiation Effect on Transformation of Zirconia -MPS nBBs-Based Gels into Hybrid Transparent Dielectric Thin Films.

Authors:  Viorica Muşat; Elena Emanuela Herbei; Elena Maria Anghel; Michael P M Jank; Susanne Oertel; Daniel Timpu; Laurenţiu Frangu
Journal:  Gels       Date:  2022-01-20

4.  Synthesis, oxide formation, properties and thin film transistor properties of yttrium and aluminium oxide thin films employing a molecular-based precursor route.

Authors:  Nico Koslowski; Rudolf C Hoffmann; Vanessa Trouillet; Michael Bruns; Sabine Foro; Jörg J Schneider
Journal:  RSC Adv       Date:  2019-10-02       Impact factor: 4.036

5.  Aqueous Solution-Processed Nanometer-Thin Crystalline Indium Ytterbium Oxide Thin-Film Transistors.

Authors:  Wangying Xu; Chuyu Xu; Liping Hong; Fang Xu; Chun Zhao; Yu Zhang; Ming Fang; Shun Han; Peijiang Cao; Youming Lu; Wenjun Liu; Deliang Zhu
Journal:  Nanomaterials (Basel)       Date:  2022-04-05       Impact factor: 5.076

6.  Solution-processable and photopolymerisable TiO2 nanorods as dielectric layers for thin film transistors.

Authors:  Fei Cheng; Emanuele Verrelli; Fahad A Alharthi; Satyajit Das; Thomas D Anthopoulos; Khue T Lai; Neil T Kemp; Mary O'Neill; Stephen M Kelly
Journal:  RSC Adv       Date:  2020-07-06       Impact factor: 4.036

7.  Water-Processed Ultrathin Crystalline Indium-Boron-Oxide Channel for High-Performance Thin-Film Transistor Applications.

Authors:  Wangying Xu; Tao Peng; Yujia Li; Fang Xu; Yu Zhang; Chun Zhao; Ming Fang; Shun Han; Deliang Zhu; Peijiang Cao; Wenjun Liu; Youming Lu
Journal:  Nanomaterials (Basel)       Date:  2022-03-29       Impact factor: 5.076

8.  Water-Induced Nanometer-Thin Crystalline Indium-Praseodymium Oxide Channel Layers for Thin-Film Transistors.

Authors:  Wangying Xu; Chuyu Xu; Zhibo Zhang; Weicheng Huang; Qiubao Lin; Shuangmu Zhuo; Fang Xu; Xinke Liu; Deliang Zhu; Chun Zhao
Journal:  Nanomaterials (Basel)       Date:  2022-08-22       Impact factor: 5.719

Review 9.  Application of Laser Treatment in MOS-TFT Active Layer Prepared by Solution Method.

Authors:  Nanhong Chen; Honglong Ning; Zhihao Liang; Xianzhe Liu; Xiaofeng Wang; Rihui Yao; Jinyao Zhong; Xiao Fu; Tian Qiu; Junbiao Peng
Journal:  Micromachines (Basel)       Date:  2021-11-30       Impact factor: 2.891

  9 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.