| Literature DB >> 29432001 |
Marc Baron1, Jason C Morris1, Siham Telitel2,3, Jean-Louis Clément1, Jacques Lalevée2,3, Fabrice Morlet-Savary2,3, Arnaud Spangenberg2,3, Jean-Pierre Malval2,3, Olivier Soppera2,3, Didier Gigmes1, Yohann Guillaneuf1.
Abstract
The use of UV/visible light irradiation as a means to initiate organic syntheses is increasingly attractive due to the high spatial and temporal control conferred by photochemical processes. The aim of this work is thus to demonstrate that alkoxyamines bearing a chromophore on the alkyl moiety can provide a photoprotecting group for the sensitive nitroxide functionality, that is known to degrade through redox processes. The dissociation of various photosensitive alkoxyamines was studied from 223 to 298 K under UV/visible irradiation, depending on the nature of the chromophore. In each case a rapid (typically in less than 1 h) and near-quantitative dissociation was observed. As an illustration of the interest of this approach, a pyrene-based alkoxyamine was employed for the spatially controlled coupling of polymer chains onto Si wafers to produce micropatterned surfaces.Entities:
Year: 2018 PMID: 29432001 DOI: 10.1021/jacs.7b12807
Source DB: PubMed Journal: J Am Chem Soc ISSN: 0002-7863 Impact factor: 15.419