| Literature DB >> 29319290 |
Lan Nguyen1, Teruo Hashimoto1, Dmitri N Zakharov2, Eric A Stach2,3, Aidan P Rooney1, Benjamin Berkels4, George E Thompson1, Sarah J Haigh1, Tim L Burnett1.
Abstract
The surface oxidation of aluminum is still poorly understood despite its vital role as an insulator in electronics, in aluminum-air batteries, and in protecting the metal against corrosion. Here we use atomic resolution imaging in an environmental transmission electron microscope (TEM) to investigate the mechanism of aluminum oxide formation. Harnessing electron beam sputtering we prepare a pristine, oxide-free metal surface in the TEM. This allows us to study, as a function of crystallographic orientation and oxygen gas pressure, the full oxide growth regime from the first oxide nucleation to a complete saturated, few-nanometers-thick surface film.Entities:
Keywords: aluminum; electron energy loss spectroscopy; environmental transmission electron microscopy; high resolution transmission electron microscopy; nucleation; oxide; transmission electron microscopy
Year: 2018 PMID: 29319290 DOI: 10.1021/acsami.7b17224
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229