| Literature DB >> 29309606 |
Shigeyuki Morishita1, Ryo Ishikawa2, Yuji Kohno1, Hidetaka Sawada1, Naoya Shibata2, Yuichi Ikuhara2.
Abstract
The achievement of a fine electron probe for high-resolution imaging in scanning transmission electron microscopy requires technological developments, especially in electron optics. For this purpose, we developed a microscope with a fifth-order aberration corrector that operates at 300 kV. The contrast flat region in an experimental Ronchigram, which indicates the aberration-free angle, was expanded to 70 mrad. By using a probe with convergence angle of 40 mrad in the scanning transmission electron microscope at 300 kV, we attained the spatial resolution of 40.5 pm, which is the projected interatomic distance between Ga-Ga atomic columns of GaN observed along [212] direction.Year: 2018 PMID: 29309606 DOI: 10.1093/jmicro/dfx122
Source DB: PubMed Journal: Microscopy (Oxf) ISSN: 2050-5698 Impact factor: 1.571