Literature DB >> 29164705

Molecular Engineering of MnII Diamine Diketonate Precursors for the Vapor Deposition of Manganese Oxide Nanostructures.

Chiara Maccato1, Lorenzo Bigiani1, Giorgio Carraro1, Alberto Gasparotto1, Roberta Seraglia2, Jiyeon Kim3, Anjana Devi3, Gloria Tabacchi4, Ettore Fois4, Giuseppe Pace2, Vito Di Noto5, Davide Barreca2.   

Abstract

Molecular engineering of manganese(II) diamine diketonate precursors is a key issue for their use in the vapor deposition of manganese oxide materials. Herein, two closely related β-diketonate diamine MnII adducts with different fluorine contents in the diketonate ligands are examined. The target compounds were synthesized by a simple procedure and, for the first time, thoroughly characterized by a joint experimental-theoretical approach, to understand the influence of the ligand on their structures, electronic properties, thermal behavior, and reactivity. The target compounds are monomeric and exhibit a pseudo-octahedral coordination of the MnII centers, with differences in their structure and fragmentation processes related to the ligand nature. Both complexes can be readily vaporized without premature side decompositions, a favorable feature for their use as precursors for chemical vapor deposition (CVD) or atomic layer deposition applications. Preliminary CVD experiments at moderate growth temperatures enabled the fabrication of high-purity, single-phase Mn3 O4 nanosystems with tailored morphology, which hold great promise for various technological applications.
© 2017 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

Entities:  

Keywords:  Mn β-diketonates; chemical vapor deposition; manganese oxides; nanomaterials; single-crystal X-ray diffraction

Year:  2017        PMID: 29164705     DOI: 10.1002/chem.201703423

Source DB:  PubMed          Journal:  Chemistry        ISSN: 0947-6539            Impact factor:   5.236


  1 in total

1.  Heteroleptic manganese compounds as potential precursors for manganese based thin films and nanomaterials.

Authors:  Sunju Lee; Ga Yeon Lee; Chang Gyoun Kim; Taek-Mo Chung; Bo Keun Park
Journal:  RSC Adv       Date:  2020-08-11       Impact factor: 4.036

  1 in total

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