Literature DB >> 29084429

Dependence of the Electrochemical Redox Properties of Fullerenes on Ionic Liquids.

Hiroyuki Ueda, Tomoaki Yoshimura, Katsuhiko Nishiyama1, Soichiro Yoshimoto1.   

Abstract

Control of the electrochemical properties of fullerenes via the chemical modification approach has attracted considerable attention. However, surface modification of fullerene cages with various functional groups can lead to the destruction of their original structures. Herein, we report a simple approach for controlling the electrochemical properties of fullerene thin films formed on Au(111) electrodes in various ionic liquids (ILs). A total of eight reversible redox couples for six reductive and two oxidative processes were observed for fullerenes in ammonium- and pyrrolidinium-based ILs. The redox potentials, the differences between two successive redox potentials, the average values of these potential differences for fullerene reduction, and the electrochemical band gaps of fullerene films in various ILs were found to depend on the cation and its alkyl chain length, the anion, and the chemical structure of the fullerene. Highly charged C70 anions were reduced more easily than C60 anions. An increase in the alkyl chain length of the cation led to an increase in the average potential difference between two successive redox potentials for fullerene reduction. The results indicate that the electrochemical band gaps of fullerenes can be manipulated using ILs with appropriate anions, which can be determined based on the size of the anion and the charge distribution.

Entities:  

Year:  2017        PMID: 29084429     DOI: 10.1021/acs.langmuir.7b03076

Source DB:  PubMed          Journal:  Langmuir        ISSN: 0743-7463            Impact factor:   3.882


  1 in total

1.  Dataset of the electrochemical potential windows for the Au(hkl)|ionic liquid interfaces defined by the cut-off current densities.

Authors:  Hiroyuki Ueda; Soichiro Yoshimoto
Journal:  Data Brief       Date:  2021-11-18
  1 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.