Literature DB >> 29083157

Influence of High-Energy Proton Irradiation on β-Ga2O3 Nanobelt Field-Effect Transistors.

Gwangseok Yang1, Soohwan Jang2, Fan Ren, Stephen J Pearton, Jihyun Kim1.   

Abstract

The robust radiation resistance of wide-band gap materials is advantageous for space applications, where the high-energy particle irradiation deteriorates the performance of electronic devices. We report on the effects of proton irradiation of β-Ga2O3 nanobelts, whose energy band gap is ∼4.85 eV at room temperature. Back-gated field-effect transistor (FET) based on exfoliated quasi-two-dimensional β-Ga2O3 nanobelts were exposed to a 10 MeV proton beam. The proton-dose- and time-dependent characteristics of the radiation-damaged FETs were systematically analyzed. A 73% decrease in the field-effect mobility and a positive shift of the threshold voltage were observed after proton irradiation at a fluence of 2 × 1015 cm-2. Greater radiation-induced degradation occurs in the conductive channel of the β-Ga2O3 nanobelt than at the contact between the metal and β-Ga2O3. The on/off ratio of the exfoliated β-Ga2O3 FETs was maintained even after proton doses up to 2 × 1015 cm-2. The radiation-induced damage in the β-Ga2O3-based FETs was significantly recovered after rapid thermal annealing at 500 °C. The outstanding radiation durability of β-Ga2O3 renders it a promising building block for space applications.

Entities:  

Keywords:  gallium oxide; proton irradiation; thermal annealing; two-dimensional materials; wide-band gap semiconductors

Year:  2017        PMID: 29083157     DOI: 10.1021/acsami.7b13881

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  2 in total

1.  Controlled growth of 2D ultrathin Ga2O3 crystals on liquid metal.

Authors:  Menghan Li; Lin Li; Yixuan Fan; Le Huang; Dechao Geng; Wensheng Yang
Journal:  Nanoscale Adv       Date:  2021-06-15

Review 2.  Recent Advances in β-Ga2O3-Metal Contacts.

Authors:  Ya-Wei Huan; Shun-Ming Sun; Chen-Jie Gu; Wen-Jun Liu; Shi-Jin Ding; Hong-Yu Yu; Chang-Tai Xia; David Wei Zhang
Journal:  Nanoscale Res Lett       Date:  2018-08-22       Impact factor: 4.703

  2 in total

北京卡尤迪生物科技股份有限公司 © 2022-2023.