| Literature DB >> 29038578 |
Takashi Hasegawa1, Shunsuke Kanatani2, Miyu Kazaana2, Kairi Takahashi2, Kohei Kumagai2, Maiko Hirao2, Shunji Ishio2.
Abstract
The development of magnetic materials with large uniaxial magnetic anisotropy (K u) and high saturation magnetization has attracted much attention in various areas such as high-density magnetic storage, spintronic devices, and permanent magnets. Although FeCo alloys with the body-centred cubic structure exhibit the highest M s among all transition metal alloys, their low K u and coercivity (H c) make them unsuitable for these applications. However, recent first-principles calculations have predicted large K u for the FeCo films with the body-centred tetragonal structure. In this work, we experimentally investigated the hard magnetic properties and magnetic domain structures of nanopatterned FeCo alloy thin films. As a result, a relatively large value of the perpendicular uniaxial magnetic anisotropy K u = 2.1 × 106 J·m-3 was obtained, while the H c of the nanopatterned FeCo layers increased with decreasing dot pattern size. The maximum H c measured in this study was 4.8 × 105 A·m-1, and the corresponding value of μ 0 H c was 0.60 T, where μ 0 represented the vacuum permeability.Entities:
Year: 2017 PMID: 29038578 PMCID: PMC5643401 DOI: 10.1038/s41598-017-13602-x
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Crystal structure and magnetic properties of the continuous FeCo(Al) thin films. (a) t dependence of c/a. The error bars were calculated from the full widths at half maximum of the XRD peaks. Inset: illustration of the relationship between the fcc and bct unit cells at c/a = 1.41. The broken lines plotted at c/a = 1.00 and 1.41 correspond to the bcc and fcc structures, respectively. (b) Perpendicular magnetization curves (⊥). (c) t dependence of K u. The error bars were calculated from the noise widths of the magnetization curves recorded by the VSM. (d) t dependence of K u × t.
Figure 2Nanopatterning process. (a) Fabrication via electron beam lithography. (b) A top view of the obtained dot patterns.
Figure 3Surface topography and magnetic domains of the fabricated dots. (a–c) SEM images. (d–f) Demagnetized MFM images.
Figure 4Magnetic properties of the nanopatterned samples. (a) Normalized perpendicular magnetization curves (⊥). (b) D dependence of μ 0 H c determined via experimental measurements (filled symbols) and theoretical simulations (open symbols).