Literature DB >> 28922482

Bottom-Up Single-Electron Transistors.

Ksenia S Makarenko1, Zhihua Liu1, Michel P de Jong1, Floris A Zwanenburg1, Jurriaan Huskens2, Wilfred G van der Wiel1.   

Abstract

As the downscaling of conventional semiconductor electronics becomes more and more challenging, the interest in alternative material systems and fabrication methods is growing. A novel bottom-up approach for the fabrication of high-quality single-electron transistors (SETs) that can easily be contacted electrically in a controllable manner is developed. This approach employs the self-assembly of Au nanoparticles forming the SETs, and Au nanorods forming the leads to macroscopic electrodes, thus bridging the gap between the nano- and microscale. Low-temperature electron-transport measurements reveal exemplary single-electron tunneling characteristics. SET behavior can be significantly changed, post-fabrication, using molecular exchange of the tunnel barriers, demonstrating the tunability of the assemblies. These results form a promising proof of principle for the versatility of bottom-up nanoelectronics, and toward controlled fabrication of nanoelectronic devices.
© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Entities:  

Keywords:  Coulomb blockade; bottom-up fabrication; self-assembly; single-electron transistors

Year:  2017        PMID: 28922482     DOI: 10.1002/adma.201702920

Source DB:  PubMed          Journal:  Adv Mater        ISSN: 0935-9648            Impact factor:   30.849


  1 in total

1.  Double gate operation of metal nanodot array based single electron device.

Authors:  Takayuki Gyakushi; Ikuma Amano; Atsushi Tsurumaki-Fukuchi; Masashi Arita; Yasuo Takahashi
Journal:  Sci Rep       Date:  2022-07-06       Impact factor: 4.996

  1 in total

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