Literature DB >> 28876044

High-Performance Nano-Photoinitiators with Improved Safety for 3D Printing.

Yanyang Han1, Fei Wang2, Chin Yan Lim3, Hong Chi4, Dairong Chen1, FuKe Wang2, Xiuling Jiao1.   

Abstract

In this work, we report the first hybrid nanosized photoinitiators with low cytotoxicity and migration by coupling of polyhedral oligomeric silsesquioxanes (POSS) to benzophenone derivatives. This new series of photoinitiators were fully characterized and showed many favorable properties such as uniform sizes, extremely low tendency to migrate, less effect on resin viscosity, enhanced thermal stability and mechanical strength, increased photoactivity, and significantly lower cell toxicity compared to their corresponding benzophenone molecules. The utility of these hybrid nanosized photoinitiators in 3D printing was demonstrated in printing of various 3D structures with high resolution and accuracy.

Entities:  

Keywords:  3D printing safety; POSS; additive manufacturing; benzophenone; photoinitiators; printable resin

Year:  2017        PMID: 28876044     DOI: 10.1021/acsami.7b08399

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  4 in total

1.  The formulation and characterization of 3D printed grafts as vascular access for potential use in hemodialysis.

Authors:  Bill Cheng; Yue-Min Xing; Nai-Chia Shih; Jen-Po Weng; Hsin-Chieh Lin
Journal:  RSC Adv       Date:  2018-04-24       Impact factor: 4.036

Review 2.  Self-Assembly and Applications of Amphiphilic Hybrid POSS Copolymers.

Authors:  Hong Chi; Mingyue Wang; Yiting Xiao; Fuke Wang; Joshy K S
Journal:  Molecules       Date:  2018-09-27       Impact factor: 4.411

Review 3.  3D-Printed Chips: Compatibility of Additive Manufacturing Photopolymeric Substrata with Biological Applications.

Authors:  Megan Carve; Donald Wlodkowic
Journal:  Micromachines (Basel)       Date:  2018-02-23       Impact factor: 2.891

4.  Enhancing the mechanical strength and toughness of epoxy resins with linear POSS nano-modifiers.

Authors:  Hong Chi; Guocheng Zhang; Ning Wang; Yaoguang Wang; Tianduo Li; FuKe Wang; Chen Ye
Journal:  Nanoscale Adv       Date:  2022-01-07
  4 in total

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