| Literature DB >> 28817010 |
Abstract
Transparent conducting oxide (TCO) materials are implemented into a wide variety of commercial devices because they possess a unique combination of high optical transparency and high electrical conductivity. Created during the processing of the TCOs, defects within the atomic-scale structure are responsible for their desirable optical and electrical properties. Therefore, studying the defect structure is essential to a better understanding of the behavior of transparent conductors. X-ray and neutron scattering techniques are powerful tools to investigate the atomic lattice structural defects in these materials. This review paper presents some of the current developments in the study of structural defects in n-type TCOs using x-ray diffraction (XRD), neutron diffraction, extended x-ray absorption fine structure (EXAFS), pair distribution functions (PDFs), and x-ray fluorescence (XRF).Entities:
Keywords: EXAFS; PDF; XRF; defect; indium-tin oxide; neutron diffraction; tin oxide; transparent conducting oxide; x-ray diffraction; zinc oxide
Year: 2012 PMID: 28817010 PMCID: PMC5458970 DOI: 10.3390/ma5050818
Source DB: PubMed Journal: Materials (Basel) ISSN: 1996-1944 Impact factor: 3.623
Figure 1Non-equivalent b and d cations sites found in bixbyite In2O3.
Figure 2Nearest cations surrounding an oxygen interstitial located at the c sites in the bixbyite structure.
Figure 3One unit cell of rutile SnO2.
Figure 4A unit cell of rutile SnO2 showing the location of interstitial antimony refined by Berry and Greaves [63].
Figure 5A unit cell of rutile SnO2 showing the location of interstitial fluorine proposed by Canestrato et al. [67].
Figure 6ZnO wurtzite structure (four unit cells are shown).