| Literature DB >> 28792227 |
Ahmet Avsar1,2,3, Jun Y Tan1,2, Xin Luo1,4, Khoong Hong Khoo5, Yuting Yeo1,2, Kenji Watanabe6, Takashi Taniguchi6, Su Ying Quek1,2, Barbaros Özyilmaz1,2.
Abstract
Because of the chemical inertness of two dimensional (2D) hexagonal-boron nitride (h-BN), few atomic-layer h-BN is often used to encapsulate air-sensitive 2D crystals such as black phosphorus (BP). However, the effects of h-BN on Schottky barrier height, doping, and contact resistance are not well-known. Here, we investigate these effects by fabricating h-BN encapsulated BP transistors with cobalt (Co) contacts. In sharp contrast to directly Co contacted p-type BP devices, we observe strong n-type conduction upon insertion of the h-BN at the Co/BP interface. First-principles calculations show that this difference arises from the much larger interface dipole at the Co/h-BN interface compared to the Co/BP interface, which reduces the work function of the Co/h-BN contact. The Co/h-BN contacts exhibit low contact resistances (∼4.5 kΩ) and are Schottky barrier-free. This allows us to probe high electron mobilities (4,200 cm2/(V s)) and observe insulator-metal transitions even under two-terminal measurement geometry.Entities:
Keywords: Work-function; black phosphorus; boron nitride; encapsulation; tunnel barrier
Year: 2017 PMID: 28792227 DOI: 10.1021/acs.nanolett.7b01817
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189