Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing.

The Schottky junction source/drain structure has great potential to replace the traditional p/n junction source/drain structure of the future ultra-scaled metal-oxide-semiconductor field effect transistors (MOSFETs), as it can form ultimately shallow junctions. However, the effective Schottky barrier height (SBH) of the Schottky junction needs to be tuned to be lower than 100 meV in order to obtain a high driving current. In this paper, microwave annealing is employed to modify the effective SBH of NiSi on Si via boron or arsenic dopant segregation. The barrier height decreased from 0.4-0.7 eV to 0.2-0.1 eV for both conduction polarities by annealing below 400 °C. Compared with the required temperature in traditional rapid thermal annealing, the temperature demanded in microwave annealing is ~60 °C lower, and the mechanisms of this observation are briefly discussed. Microwave annealing is hence of high interest to future semiconductor processing owing to its unique capability of forming the metal/semiconductor contact at a remarkably lower temperature.

1. Introduction

The tuning of Schottky barrier height (SBH) between metal silicide and underlying Si by the dopant segregation (DS) technique has recently been extensively explored for the development of integrated circuits of advanced technology nodes. The barrier height of the junction in the actual metal-semiconductor interface is deemed effective SBH, for which the influence of the electric field is taken into account [1]. Ultra-low contact resistivity between Ni1-xPtxSi and Si at the level of 6–7 × 10−9 Ohm∙cm−2, which is highly desirable for the 3-D metal-oxide-semiconductor field effect transistor (MOSFET) structures for the 15-nm node and beyond, has been reported with SBH tuning with the DS technique [2]. Meanwhile, a metal silicide Schottky junction source/drain (S/D) structure with low effective SBHs tuned by DS has also attracted substantial research interest [3,4], since it has great potential to replace the conventional shallow p/n junction S/D in the future ultra-scaled MOSFETs, which require extremely shallow and low series resistance S/D regions.

The effective SBH is required to be lower than 100 meV in order to obtain a high driving current for the application of the Schottky junction S/D in the scaled MOSFETs [4,5]. To introduce dopants into the metal silicide/Si interface and hence tune the effective SBH towards 100 meV, mainly two DS schemes have been explored: silicide-induced dopant segregation (SIDS) [6,7] and silicide as a diffusion source (SADS) [6,7,8]. In both cases, the dopants are driven and finally segregate at the silicide/Si interface by a thermal treatment such as the rapid thermal annealing (RTA) process. The RTA temperature has reportedly been above 500 °C in order to effectively tune SBH to the saturated level [6,7,8].

The application of microwave annealing (MWA) in semiconductor processing has recently gained increasing attention due to the unique features related to the MWA process. MWA has been reported to be able to form metal silicide [9,10,11,12] and activate dopants [11,13] at a significantly lower temperature compared with the conventional RTA process. The temperature differences were reported to be around 100 °C [9,10,11] or even close to 200 °C [11,13]. In this work, we experimentally demonstrate SBH tuning with the DS technique with a low-temperature MWA process and explore the related mechanisms. The SIDS scheme is adopted in the experiments due to its effectiveness [6,7] in SBH tuning and relatively simpler process flow compared with the SADS scheme.

2. Experimental Section

Both p-type and n-type 4-inch (100) epitaxial wafers were used as the substrates. The thickness of the 1–10 Ω∙cm epitaxial layer was 5 μm. After the deposition of a 200-nm-thick SiO2 layer via low-pressure chemical vapor deposition, lithography and dry etch of the SiO2 layer were conducted to form a circular hole with a diameter of 100 μm. Boron (B) with a dose of 1 × 1015 cm−2 at 1 keV and arsenic (As) with a dose of 1 × 1015 cm−2 at 7 keV were then implanted into the n-type and p-type substrates, respectively. After removal of the photoresist, a 40-nm Ni film was deposited via sputter, preceded by a wet cleaning step with hydrofluoric acid to remove the remaining oxide on the Si surface in the hole. The wafers were then sliced into square-shaped samples with a size of about 25 mm × 25 mm, followed by a drive-in anneal via MWA or RTA for various durations and at various temperatures in a N2 atmosphere (see Table 1). The schematic description of the process flow is illustrated in Figure 1a.

Table 1

Annealing temperature and duration for both microwave annealing (MWA) and rapid thermal annealing (RTA) techniques. (The corresponding microwave power for 319 °C, 377 °C, and 414 °C MWA are 2100 W, 2800 W, and 3500 W, respectively.

Implanted Ions/Substrate	Arsenic/p-Type			Boron/n-Type
Annealing technique	MWA	RTA	RTA	MWA	RTA	RTA
Time (s)	600	600	30	600	600	30
Temperature (°C)	319	377	500	319	377	500
	377	414	550	377	414	550
	414	500	600	414	500	600
	-	550	650	-	550	650
	-	600	700	-	600	700
	-	-	750	-	-	750

Figure 1

(a) Process flow; (b) temperature profiles of the MWA processes performed at different microwave powers.

The MWA was carried out in a DSGI (DSG Incorporation, Santa Clara, CA, USA) octagonal MWA chamber at a frequency of 5.8 GHz. Vertically stacked wafers are supported by three quartz rods inside a quartz chamber. The samples were placed in the middle of the chamber where the electromagnetic field is most uniform. The sample temperature was monitored directly using a Raytek (Santa Cruz, CA, USA) XR infrared pyrometer, which is sitting at the bottom of the MWA chamber and facing the backside of the wafer. The measured temperature is supposed to reflect the temperature of the backside of the bulk Si. Calibration work of experimental (Figure A1 and Figure A2) and simulation (Figure A3 and Figure A4) was done to understand the error of the temperature measurement of the MWA facility. The infrared pyrometer was found to underestimate the temperature of the samples, and the deviation is shown to be no more than 43 °C and 30 °C for the n-type and p-type samples in this work (Figure A2), respectively. A simple simulation of heat transfer was also carried out to study the temperature difference that may exists between the two sides of the wafer. The detail of the calibration and simulation is depicted in Appendix A.

Figure A1

Schematic illustration of the temperature calibration system.

Figure A2

Temperature profile of pyrometer and thermal couple of (a) the n-type sample and (b) the p-type sample.

Figure A3

The simulation result of heat transfer of the chamber and the wafer.

Figure A4

(a) The temperature versus the depth from the surface of the wafer; (b) The zoomed cross-sectional view of the temperature profile of the wafer.

The temperature profiles and the corresponding peak temperatures (Tp) of the MWA-treated samples are shown in Figure 1b. For comparison with the MWA samples and other published results [6,7,8], RTA with durations of both 600 and 30 s were performed. After annealing, the unreacted Ni was selectively removed with a piranha solution, which is a mixture of sulfuric acid and hydrogen peroxide.

3. Results and Discussion

The Raman spectra of RTA 377 °C, RTA 600 °C, and MWA 319 °C annealed n-type samples were measured and are shown in Figure 2. The monosilicide (NiSi) is formed under all the three annealing conditions according to the appearance of the peaks of NiSi reported in the literature [14]. No obvious Ni2Si peaks [15] are detected, indicating the transformation from Ni2Si to NiSi has almost been accomplished. Additionally, there are no peaks of NiSi2 [16] observed in the spectrum of the RTA 600 °C sample, for the temperature is much lower than 750 °C, which is the transition point of NiSi to NiSi2 [17]. Since the samples with the highest temperature and the lowest temperature all form nickel monosilicide, it is reasonable to conclude that the samples of the medium temperatures have also formed nickel monosilicide.

Figure 2

Raman spectra of the n-type samples.

As shown in the secondary ion mass spectrometry (SIMS) results in Figure 3, compared with the as-implanted dopant profiles prior to annealing, the As and B dopants, after the SIDS process with either MWA or RTA, are found to all pile up and segregate in the vicinity of the NiSi/Si interface. The dopant segregation at the NiSi/Si interface can be explained by the low solid solubility of B and As in nickel silicide [6] and by the negligible diffusion of these dopants in Si at sub-800 °C temperature [18]. The observed larger tail and deviated peak position in the SIMS profile of the As-implanted RTA sample at 377 °C might be attributed to the relatively incomplete transition of NiSi from Ni2Si as a result of the retardation of the Ni diffusion due to larger silicide grains induced by As [19]. The deeper distribution of the As compared to that of the B may be attributed to the higher peak concentration of the As and the channel effect of the As during implantation, which may bring a higher doping level of As than of B at a depth of around 120 nm.

Figure 3

Secondary ion mass spectrometry (SIMS) profiles of (a) As dopants on p-type substrate; and (b) B dopants on n-type substrate before and after annealing.

The diodes are characterized using capacitance-voltage (C-V) and current-voltage (I-V) measurements. Original C-V data have been re-calculated for the plot of 1/C2 versus voltage to extract the hole SBH (ϕbp) on the p-type substrate and the electron SBH (ϕbn) on the n-type substrate. The capacitance per unit area of the diodes on n-type substrate is related to the SBH through the following relation [20]: where V is the bias voltage; N the net doping concentration of the impurity; and ε the dielectric constant. The barrier heights were then determined from the intercept of the straight lines on the voltage axis.

The C-V and I-V characteristics of the produced diodes with B implants into the n-type substrate processed by MWA or RTA at 377 °C for 600 s are shown in Figure 4. The ϕbn is extracted and found to be 0.94 and 0.87 eV (corresponding ϕbp are 0.18 and 0.25 eV, since ϕbp + ϕbn ≈ 1.12 eV for Si) for the MWA and RTA diodes, respectively. According to the thermionic emission theory, the current of the diode in this paper can be depicted as [21]: where A* is the Richardson’s constant; T the temperature; φ the barrier height; and V the bias voltage applied. At the same voltage and temperature, the current is the negative exponential function of ϕbn. This can well explain the observation that the leakage current at reverse bias and the forward current when the bias voltage is below 0.35 V of the MWA diode are clearly lower than that of the RTA diode. The higher current of the MWA diode in the over-0.4 V regime should be attributed to a smaller serial resistance. The difference of the serial resistance may come from the contact between the probe and the pad or the substrate and the ground, as well as the diversity that may exist between the silicide formed by two ways of annealing. Nevertheless, the serial resistance is negligible when the voltage ranges from −1.0 V to 0.35 V, as it is too small to share the voltage with the junction. Furthermore, the ideality factor of the MWA diode (1.027) is smaller than that of the RTA diode (1.049), indicating that the MWA diode may have a higher electron SBH, which is consistent with the C-V characteristics.

Figure 4

Capacitance-voltage (C-V) and current-voltage (I-V) characteristics of diodes annealed with 600 s on the n-type substrate.

The SBH values of the produced diodes are shown in Figure 5 and listed in Table 2. The ideality factors in Table 2 are calculated corresponding to the I-V data around the forward bias voltage of 0.15 V. For both the n-type samples and the p-type samples, the MWA can obtain a SBH tuning effect similar to that of RTP, while the required temperature is ~100 °C lower. The temperature reduction should still be no less than 60 °C, even if the error of the measurement is taken into account. The detailed analysis of the figure is as follows. For the RTA samples with 30-s annealing between 500 and 750 °C, ϕbp on p-type substrate and ϕbn on n-type substrate can be tuned to a maximum of 1.06 eV and 0.96 eV, respectively, which is consistent with [6,8]. The observed fluctuation in the SBH at relatively higher temperatures may be related to the roughness and nonuniformity of the poly-NiSi/Si interface and/or possible fluctuations in the activation/deactivation of dopants when the tuning of SBH reaches saturation level. At 500 °C and above, the RTA samples with 600-s annealing show slightly lower SBH levels compared with the RTA samples with 30-s annealing for the n-type substrates, which may be attributed to the NiSi/Si interface degeneration and deactivation of the B dopants at the Si side with longer annealing time (deactivation behavior of B may be different from that of As). For the RTA samples with an As implant, a significant reduction of ϕbp is found when the temperature decreases from 500 to 414 °C. Similarly, for the RTA samples with a B implant, reduction of ϕbn is also clearly observed when the temperature decreases from 500 to 414 °C. However, for the MWA diodes annealed at 414 °C, the ϕbp and ϕbn is found to be tuned to a maximum of 1.06 eV and 0.95 eV, respectively, proving that the MWA method can tune the SBH to a similar saturated level compared with the RTA method. It is worth noting that the MWA samples annealed as low as 377 °C still demonstrate a sufficiently high ϕbp of 1.05 eV and ϕbn of 0.94 eV on the p-type and n-type substrates, respectively.

Figure 5

Annealing temperature versus (a) the hole Schottky barrier height (SBH) (ϕbp) on the p-type substrate; and (b) the electron SBH (ϕbn) on the n-type substrate.

Table 2

Effective SBH and ideality factor of each annealing condition.

Annealing Technique	Time (s)	Temperature (°C)	Implanted Ions/Substrate
			Arsenic/p-Type		Boron/n-Type
			ϕbp (eV)	Ideality Factor (@ −0.15 V)	ϕbn (eV)	Ideality Factor (@ 0.15 V)
MWA	600	319	0.96	1.077	0.85	1.021
		377	1.05	1.125	0.94	1.027
		414	1.06	1.074	0.95	1.025
RTA	600	377	0.88	1.024	0.86	1.049
		414	0.97	1.092	0.90	1.050
		500	1.04	1.063	0.93	1.056
		550	1.02	1.118	0.92	1.034
		600	1.03	1.065	0.93	1.037
	30	500	1.06	1.012	0.94	1.025
		550	1.01	1.029	0.93	1.018
		600	1.03	1.059	0.95	1.025
		650	1.04	1.043	0.95	1.043
		700	1.06	1.093	0.95	1.060
		750	1.02	1.121	0.94	1.005

According to the first-principles calculation, substitutional dopant atoms within the first Si monolayer nearby the NiSi/Si interface can induce electric dipoles across the interface, resulting in the deformation of the energy band and modification of SBH [6,7]. Therefore, it can be inferred that, at 414 °C and below, compared with RTA, MWA is much more effective at substituting Si atoms with dopant atoms at the Si side and hence induce more effective electric dipoles across the NiSi/Si interface, resulting in more SBH tuning with As or B dopants. The capability of tuning SBH between NiSi and Si at a significantly lower temperature using MWA may be ascribed to its selective heating effect [8,9,12] and unique dopant activation mechanisms [10]. For RTA, the activation of dopants is a purely thermally driven process; for MWA, the activation of dopants is a combination of a thermal effect and an additional unique non-thermal microwave effect. The non-thermal effect of MWA in Si may be mainly caused by the rotation and collision of a large amount of dipoles (such as vacancy-interstitial point defects) under the alternating electromagnetic field, which can increase the interaction probability of neighboring dipoles and equivalently reduce the dopant activation energy in Si. Hence, for MWA, the non-thermal effect may enhance the dopant activation at the NiSi/Si interface. As a result, compared with RTA, the effective tuning of SBH can happen at significantly lower bulk-Si temperatures for MWA.

4. Conclusions

The MWA method has been successfully used to form NiSi/Si Schottky junction and effectively tune the SBH between NiSi and Si. Compared with conventional RTA method, MWA can obtain saturated electron and hole SBHs at significantly lower temperature. A high hole SBH (ϕbp = 1.05 eV) and electron SBH (ϕbn = 0.94 eV), i.e., low electron SBH (ϕbn = 0.07 eV) and hole SBH (ϕbp = 0.18 eV), are achieved with MWA at 377 °C on p-type and n-type substrates, respectively. The success of SBH tuning at sub-400 °C via MWA opens the door of formation of metal source/drain and reduction of silicide contact resistance during the back-end of process (BEOL) as well as application of MWA in future monolithic 3D sequential integration where low-temperature formation of source/drain and contacts is of high importance. More comprehensive research on the metal/semiconductor contacts treated via MWA will be subsequently conducted using more test structures including circular Transmission Line Measurement (TLM) [22] and Schottky barrier MOSFETs.