Literature DB >> 28750328

Inactivation efficiency of plasmid-encoded antibiotic resistance genes during water treatment with chlorine, UV, and UV/H2O2.

Younggun Yoon1, Hay Jung Chung1, Doris Yoong Wen Di1, Michael C Dodd2, Hor-Gil Hur1, Yunho Lee3.   

Abstract

This study assessed the inactivation efficiency of plasmid-encoded antibiotic resistance genes (ARGs) both in extracellular form (e-ARG) and present within Escherichia coli (intracellular form, i-ARG) during water treatment with chlorine, UV (254 nm), and UV/H2O2. A quantitative real-time PCR (qPCR) method was used to quantify the ARG damage to ampR (850 bp) and kanR (806 bp) amplicons, both of which are located in the pUC4K plasmid. The plate count and flow cytometry methods were also used to determine the bacterial inactivation parameters, such as culturability and membrane damage, respectively. In the first part of the study, the kinetics of E. coli inactivation and ARG damage were determined in phosphate buffered solutions. The ARG damage occurred much more slowly than E. coli inactivation in all cases. To achieve 4-log reduction of ARG concentration at pH 7, the required chlorine exposure and UV fluence were 33-72 (mg × min)/L for chlorine and 50-130 mJ/cm2 for UV and UV/H2O2. After increasing pH from 7 to 8, the rates of ARG damage decreased for chlorine, while they did not vary for UV and UV/H2O2. The i-ARGs mostly showed lower rates of damage compared to the e-ARGs due to the protective roles of cellular components against oxidants and UV. The contribution of OH radicals to i-ARG damage was negligible in UV/H2O2 due to significant OH radical scavenging by cellular components. In all cases, the ARG damage rates were similar for ampR versus kanR, except for the chlorination of e-ARGs, in which the damage to ampR occurred faster than that to kanR. Chlorine and UV dose-dependent ARG inactivation levels determined in a wastewater effluent matrix could be reasonably explained by the kinetic data obtained from the phosphate buffered solutions and the expected oxidant (chlorine and OH radicals) demands by water matrix components. These results can be useful in optimizing chlorine and UV-based disinfection systems to achieve ARG inactivation.
Copyright © 2017 Elsevier Ltd. All rights reserved.

Entities:  

Keywords:  Antibiotic resistance; Antibiotic resistance genes; Chlorine; Disinfection; Hydroxyl radical; UV

Mesh:

Substances:

Year:  2017        PMID: 28750328     DOI: 10.1016/j.watres.2017.06.056

Source DB:  PubMed          Journal:  Water Res        ISSN: 0043-1354            Impact factor:   11.236


  8 in total

1.  Experimental investigation and mathematical modeling for microbial removal using potassium permanganate as an oxidant-case study: water treatment plant No. 1, Mashhad, Iran.

Authors:  Mohammad Gheibi; Nima Emrani; Mohammad Eftekhari; Mehran Akrami; Javad Abdollahi; Mahmood Ramezani; Alireza Sedghian
Journal:  Environ Monit Assess       Date:  2019-02-08       Impact factor: 2.513

Review 2.  Degradation of Bacterial Antibiotic Resistance Genes during Exposure to Non-Thermal Atmospheric Pressure Plasma.

Authors:  Ibtissam Courti; Cristina Muja; Thomas Maho; Florent P Sainct; Philippe Guillot
Journal:  Antibiotics (Basel)       Date:  2022-05-31

Review 3.  Sunlight-mediated inactivation of health-relevant microorganisms in water: a review of mechanisms and modeling approaches.

Authors:  Kara L Nelson; Alexandria B Boehm; Robert J Davies-Colley; Michael C Dodd; Tamar Kohn; Karl G Linden; Yuanyuan Liu; Peter A Maraccini; Kristopher McNeill; William A Mitch; Thanh H Nguyen; Kimberly M Parker; Roberto A Rodriguez; Lauren M Sassoubre; Andrea I Silverman; Krista R Wigginton; Richard G Zepp
Journal:  Environ Sci Process Impacts       Date:  2018-08-16       Impact factor: 4.238

4.  Chlorine disinfection promotes the exchange of antibiotic resistance genes across bacterial genera by natural transformation.

Authors:  Min Jin; Lu Liu; Da-Ning Wang; Dong Yang; Wei-Li Liu; Jing Yin; Zhong-Wei Yang; Hua-Ran Wang; Zhi-Gang Qiu; Zhi-Qiang Shen; Dan-Yang Shi; Hai-Bei Li; Jian-Hua Guo; Jun-Wen Li
Journal:  ISME J       Date:  2020-04-23       Impact factor: 10.302

Review 5.  From Conventional Disinfection to Antibiotic Resistance Control-Status of the Use of Chlorine and UV Irradiation during Wastewater Treatment.

Authors:  Muhammad Umar
Journal:  Int J Environ Res Public Health       Date:  2022-01-31       Impact factor: 3.390

6.  Chloride Enhances DNA Reactivity with Chlorine under Conditions Relevant to Water Treatment.

Authors:  Aleksandra Szczuka; Jordon Horton; Kelsey J Evans; Vincent T DiPietri; John D Sivey; Krista R Wigginton
Journal:  Environ Sci Technol       Date:  2022-08-26       Impact factor: 11.357

7.  Activated Carbon as a Cathode for Water Disinfection through the Electro-Fenton Process.

Authors:  Long Chen; Ameet Pinto; Akram N Alshawabkeh
Journal:  Catalysts       Date:  2019-07-12       Impact factor: 4.146

8.  Solar photon-Fenton process eliminates free plasmid DNA harboring antimicrobial resistance genes from wastewater.

Authors:  Pâmela B Vilela; Alessandra S Martins; Maria Clara V M Starling; Felipe A R de Souza; Giovana F F Pires; Ananda P Aguilar; Maria Eduarda A Pinto; Tiago A O Mendes; Camila C de Amorim
Journal:  J Environ Manage       Date:  2021-02-19       Impact factor: 6.789

  8 in total

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