Literature DB >> 28719182

Atomic White-Out: Enabling Atomic Circuitry through Mechanically Induced Bonding of Single Hydrogen Atoms to a Silicon Surface.

Taleana R Huff1,2, Hatem Labidi1,3, Mohammad Rashidi1,3, Mohammad Koleini1,3, Roshan Achal1,2, Mark H Salomons2,3, Robert A Wolkow1,2,3.   

Abstract

We report the mechanically induced formation of a silicon-hydrogen covalent bond and its application in engineering nanoelectronic devices. We show that using the tip of a noncontact atomic force microscope (NC-AFM), a single hydrogen atom could be vertically manipulated. When applying a localized electronic excitation, a single hydrogen atom is desorbed from the hydrogen-passivated surface and can be transferred to the tip apex, as evidenced from a unique signature in frequency shift curves. In the absence of tunnel electrons and electric field in the scanning probe microscope junction at 0 V, the hydrogen atom at the tip apex is brought very close to a silicon dangling bond, inducing the mechanical formation of a silicon-hydrogen covalent bond and the passivation of the dangling bond. The functionalized tip was used to characterize silicon dangling bonds on the hydrogen-silicon surface, which was shown to enhance the scanning tunneling microscope contrast, and allowed NC-AFM imaging with atomic and chemical bond contrasts. Through examples, we show the importance of this atomic-scale mechanical manipulation technique in the engineering of the emerging technology of on-surface dangling bond based nanoelectronic devices.

Entities:  

Keywords:  AFM; dangling bonds; mechanochemistry; nanofabrication; nanolithography; nanostructures; silicon

Year:  2017        PMID: 28719182     DOI: 10.1021/acsnano.7b04238

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  2 in total

1.  Atom-by-Atom Construction of a Cyclic Artificial Molecule in Silicon.

Authors:  Jonathan Wyrick; Xiqiao Wang; Pradeep Namboodiri; Scott W Schmucker; Ranjit V Kashid; Richard M Silver
Journal:  Nano Lett       Date:  2018-11-20       Impact factor: 11.189

2.  Lithography for robust and editable atomic-scale silicon devices and memories.

Authors:  Roshan Achal; Mohammad Rashidi; Jeremiah Croshaw; David Churchill; Marco Taucer; Taleana Huff; Martin Cloutier; Jason Pitters; Robert A Wolkow
Journal:  Nat Commun       Date:  2018-07-23       Impact factor: 14.919

  2 in total

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