| Literature DB >> 28656035 |
Qi Zhong1, Lars Melchior1, Jichang Peng2, Qiushi Huang2, Zhanshan Wang2, Tim Salditt1.
Abstract
Iterative phase retrieval has been used to reconstruct the near-field distribution behind tailored X-ray waveguideEntities:
Keywords: X-ray optics; X-ray waveguides; nano-focusing waveguide arrays
Year: 2017 PMID: 28656035 PMCID: PMC5458589 DOI: 10.1107/S1600576717004630
Source DB: PubMed Journal: J Appl Crystallogr ISSN: 0021-8898 Impact factor: 3.304
Figure 1(a) Schematic of the experimental setup. The X-ray waveguide array (WGA) is positioned at f, which is the distance from the exit of the Kirkpatrick–Baez (KB) device to the sample. The incoming beam with photon energy E and primary intensity I 0 is coupled into the Ni/C WGA with working length L, which tailors the near field to the desired shape. The far-field intensity distribution is recorded at a distance of D behind the WGA exit by a two-dimensional pixel detector. (b) A schematic of the structure of the WGA, consisting of seven guiding layers in red (, ) and eight cladding layers in purple (, ). After the pre-focus beam has been coupled, the guided mode is produced in the different guiding layers. With the working length L, the exit phase from the corresponding guiding layers i can be controlled by the variation of the layer thickness . The parameters at the exit of the WGA can be optimized such that the lines of the exit phase describe a circle with radius R, resulting in constructive interference in a quasi-focal spot (F) outside the WGA. The phase of the reference sample with length L is , with the corresponding guiding layer and cladding layers . (c) Sketch of a slab waveguide with two cladding layers and . Under the influence of the electric field inside the waveguide [], the symmetrical guided modes () and the asymmetrical mode propagate inside the guiding layer depending on the different layer thickness .
The theoretical WGA and WGM designed layer thickness
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| Layer name | Ni top | C | Ni | C | Ni | C | Ni | C | Ni | C | Ni | C | Ni | C | Ni | Si Sub |
| Waveguide array (WGA) | ||||||||||||||||
| Layer thickness (nm) | 50.0 | 15.7 | 92.3 | 17.2 | 72.8 | 17.8 | 54.2 | 18.0 | 54.2 | 17.8 | 72.8 | 17.2 | 92.3 | 15.7 | 50 | |
| Periodic waveguide multilayer (WGM) | ||||||||||||||||
| Layer thickness (nm) | 50.0 | 18.0 | 54.0 | 18.0 | 54.0 | 18.0 | 54.0 | 18.0 | 54.0 | 18.0 | 54.0 | 18.0 | 54.0 | 18.0 | 54.0 | |
Figure 2On the basis of the design parameters from Table 1 ▸, field propagation in the WGA and the WGM were simulated in the near field by FD calculations, with the incoming plane wave of unit intensity and 13.8 keV photon energy. The simulations are for waveguide lengths mm [(a) and (c) for the WGA and WGM, respectively] and mm [(b) and (d), respectively]. (e) The field distribution of a single WG (Ni [52 nm] / C [18 nm] / Ni [52 nm]) on a Ge substrate are also calculated for the length . (f) The intensity profiles in the exit plane for the WGA [purple line, (a)], the WGM [black line, (c)] and the single WG [dark-blue line, (e)] are compared. (g) Comparison of intensity profiles in the downstream planes, for the WGA (light-blue line) at a distance of 0.48 mm from the exit, for the WGM (red line) at a distance of 0.22 mm from the exit, and for the single WG (green line) at a distance of 0.02 mm from the exit. The corresponding intensities of the WGA, the WGM and the single layer at the central positions are 0.1239, 0.0747 and 0.0852, respectively.
Design parameters and averaged layer thickness as determined by TEM for the WGA structure
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| Layer name | Ni | C | Ni | C | Ni | C | Ni | C | Ni | C | Ni | C | Ni | C | Ni | |
| Theoretical design results | ||||||||||||||||
| Layer thickness (nm) | 50.00 | 15.70 | 92.30 | 17.20 | 72.80 | 17.80 | 54.20 | 18.00 | 54.20 | 17.80 | 72.80 | 17.20 | 92.30 | 15.70 | 50.00 | 658.00 |
| TEM reading averaged results, error bar ±0.45 nm | ||||||||||||||||
| Layer thickness (nm) | 51.36 | 15.40 | 95.60 | 16.87 | 76.16 | 17.19 | 57.05 | 17.60 | 57.10 | 17.15 | 76.60 | 16.16 | 96.37 | 14.62 | 52.29 | 677.52 |
Figure 3The TEM images of the cross section of the multilayer with seven C guiding layers and eight Ni cladding layers in the WGA structure, bonded to an Si cap wafer. Scale bar 50 nm.
Figure 4The measured two-dimensional far-field pattern of the WGA (a) and WGM (b) at 13.8 keV, recorded with the Eiger 4M pixel detector at a distance of m behind the structures. (c) The integrated one-dimensional far-field curves, corresponding to (a) and (b).
Figure 5(a) Schematic of the iterative reconstruction scheme. (b) Error metrics for the tight support using the ER algorithm (red line), the loose support using the ER algorithm (green line) and the tight support using the HIO algorithm (light-blue line). The reconstructed wavefronts are shown after N = 2500 iterations, for (c) the tight support using the ER algorithm (size 647 × 1663 nm in the x and y directions), (d) the loose support using the ER algorithm (size 885 × 1663 nm in the x and y directions) and (e) the tight support using the HIO algorithm (size 647 × 1663 nm in the x and y directions).
Figure 6The two-dimensional measured far-field pattern with the transmitted primary beam (PB) of (a) the WGA, compared with the reconstructed results of (b) the tight support and (c) the loose support. (d) The corresponding one-dimensional profiles, after integration along the y direction: measured far field (blue line), reconstruction with the tight support (red line) and reconstruction with the loose support (green line).
Figure 7Reconstruction for the WGM (periodic control structure). (a) The two-dimensional measured far-field pattern with the transmitted PB, and (b) the reconstructed far-field pattern. (c) The corresponding reconstructed object plane (size 454 × 1747 nm). (d) The integrated one-dimensional profiles for the measured data (red line) and the reconstruction (black line).
Figure 8Near-field distribution for (a), (b) the designed WGA, (c), (d) the measured WGA, (e), (f) the control structure WGM in theory and (g), (h) the measured WGM. (a) Design-WGA: one-dimensional FD simulation for the parameters of the designed WGA structure, showing the field in free space behind the exit plane of the WGA. (b) Design-WGA: the field distribution in the P 1 plane, corresponding to the yellow dashed line in (a), calculated by full two-dimensional FD simulations. (c) Measured-WGA reconstructed by the loose support: one-dimensional free propagation by using the parabolic wave equation in 1 + 1 dimensions ( dimensions) (Fuhse & Salditt, 2005 ▸), starting from the reconstructed near-field pattern of the WGA [reconstruction data corresponding to Fig. 5 ▸(d)]. (d) Measured-WGA reconstructed by the loose support: the field distribution in the P 3 plane, corresponding to the white dashed line in (c), calculated by the parabolic wave equation in 2 + 1 dimensions ( dimensions). (e) Design-WGM: one-dimensional FD simulation for the parameters of the designed WGM structure, showing the field in free space behind the exit plane of the WGM. (f) Design-WGM: the field distribution in the P 3 plane, corresponding to the dark-blue dashed line in (e), calculated by full two-dimensional FD simulations. (g) Measured-WGM: one-dimensional free propagation by using the parabolic wave equation in 1 + 1 dimensions, starting from the reconstructed near-field pattern of the WGM [reconstruction data corresponding to Fig. 7 ▸(c)]. (h) Measured-WGM: the field distribution in the P 4 plane, corresponding to the red dashed line in (g), calculated by the parabolic wave equation in 2 + 1 dimensions.