| Literature DB >> 28523914 |
Tae Geun Kim1, Su Ryong Ha1, Hyosung Choi1, Kyungchan Uh1, Umesha Kundapur1, Sumin Park1, Chan Woo Lee1, Sang-Hwa Lee1, Jaeyong Kim1, Jong-Man Kim1.
Abstract
Owing to its high conductivity, solution processability, mechanical flexibility, and transparency, poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) has been extensively explored for use in functional devices including solar cells, sensors, light-emitting diodes, and supercapacitors. The ability to fabricate patterned PEDOT:PSS on a solid substrate is of significant importance to develop practical applications of this conducting polymer. Herein, we describe a new approach to obtain PEDOT:PSS patterns that are based on a polymerizable supramolecular concept. Specifically, we found that UV irradiation of a photopolymerizable diacetylene containing PEDOT:PSS film followed by development in deionized water and subsequent treatment with sulfuric acid (glass and silicon wafer) or formic acid (PET) produces micron-sized PEDOT:PSS patterns on solid substrates. The newly designed photolithographic method, which can be employed to generate highly conductive (>1000 S/cm) PEDOT:PSS patterns, has many advantages including the use of aqueous process conditions, a reduced number of process steps, and no requirement for plasma etching procedures.Entities:
Keywords: PEDOT:PSS; conducting polymer; pattern; photolithography; polydiacetylene
Year: 2017 PMID: 28523914 DOI: 10.1021/acsami.7b04284
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229