| Literature DB >> 28511635 |
Davey Kreeft1, Ewout Aart Arkenbout1, Paulus Wilhelmus Johannes Henselmans1, Wouter R van Furth2, Paul Breedveld1.
Abstract
A clear visualization of the operative field is of critical importance in endoscopic surgery. During surgery the endoscope lens can get fouled by body fluids (eg, blood), ground substance, rinsing fluid, bone dust, or smoke plumes, resulting in visual impairment. As a result, surgeons spend part of the procedure on intermittent cleaning of the endoscope lens. Current cleaning methods that rely on manual wiping or a lens irrigation system are still far from ideal, leading to longer procedure times, dirtying of the surgical site, and reduced visual acuity, potentially reducing patient safety. With the goal of finding a solution to these issues, a literature review was conducted to identify and categorize existing techniques capable of achieving optically clean surfaces, and to show which techniques can potentially be implemented in surgical practice. The review found that the most promising method for achieving surface cleanliness consists of a hybrid solution, namely, that of a hydrophilic or hydrophobic coating on the endoscope lens and the use of the existing lens irrigation system.Entities:
Keywords: NOTES; SILS; biomedical engineering; flexible endoscopy; gynecologic laparoscopy; interventional endoscopy; neurosurgery; single-site surgery
Mesh:
Substances:
Year: 2017 PMID: 28511635 PMCID: PMC5603965 DOI: 10.1177/1553350617708959
Source DB: PubMed Journal: Surg Innov ISSN: 1553-3506 Impact factor: 2.058
Figure 1.Schematic showing the ACCREx classification of results. Each box in the first 3 levels represents a category to (further) divide the found methods to achieve surface cleanliness. The lowest level (under Removal and Prevention) is the final categorization of solutions that is sorted in order of discussion and numbered correspondingly to the sections in this article.
Summary of Found (Super)hydrophilic surfaces In Literature[a].
| Reference | Treatment Method | Material | Substrate | WCA Substrate (°) | WCA After Treatment (°) | WCA (°) After Irradiation, | Film Thickness (nm) | Transmittance (%) | Wavelength (nm) |
|---|---|---|---|---|---|---|---|---|---|
|
| e-Beam evaporation | ZrO2/3 pairs of SiO2/TiO2 | Glass | 10 | ~0, | 420 | 99 | 405 | |
|
| Spin coating | TiO2 (multiple layers) | HDPE | 46.7 | 0 | ~0, | |||
|
| Spin coating | TiO2 (multiple layers) | Borosilicate glass (BK7, SCHOTT) | 21.1 | 0 | ~0, | |||
|
| Spin coating | Niobia nanosheets | Soda-lime glass | 42 | <5, | ||||
|
| GLAD/dry etching | Nanocone arrays | Borosilicate glass[ | ~63 | 5 | >94.2 | 330-1800 | ||
|
| Electrospinning | Nanocrystalline TiO2 + DEA | Glass | 56.0 ± 1 | 2 ± 1 | >85 | 350-800 | ||
|
| Aqueous electrostatic layer-by-layer assembly | 120 TiO2/SiO2 bilayers | Glass | 125 | ~0, | 2421 (avg.) | 93.5 (avg.) | 400-800 | |
|
| Sol-gel dip coating | TiO2 | ITO glass | 27 | 12, | 30.1 (avg.) | |||
|
| Combined sol-gel dip coating | Glass | 89.5 | 23.5, | 75 | 94.8 | 550 | ||
|
| Dip coating in 2-propanol | TiO2 | PET | <5, | 76-95 | 400-800 | |||
|
| Dip coating in water | PtCl-TiO2 | PMMA | 136 | 6.1 | <5, | 61-92 | 400-800 | |
|
| DC reactive magnetron sputtering | TiO2-x-Nx/TiO2 bilayer | ZnO-coated ( | 25 ± 1.5 | 14 ± 1, | 830 | >71 | 400-1000 | |
|
| Sol-gel dip coating | TiO2 | Float glass | 39 ± 11 | 55 ± 6 | 0, | 300-400 | >80 | 380-1000 |
| TiO2 | Pilkington Activ | 70 ± 6 | 0, | ~15 | >76 | 380-1000 | |||
|
| ICP-RIE | Nanostructures | Borosilicate glass[ | 61 | 32 | 200 | >92 | 400-1000 | |
|
| Sol-gel dip coating | TiO2-Cu (1%) | Glass | 45.8 | 17.4, | ~1000 | >72 | 2500-25 000 | |
|
| Ultrasonic nebulization | PEG/TiO2 hydrosol | Glass | <5 | 0, | ~1.0 | |||
|
| ICP-RIE | Nanostructures | Borosilicate glass[ | 62 | 21 | 400 | >89 | 400-900 | |
|
| PVD/MPII | TiO2-Fe | Glass | 9.95 | |||||
|
| Solvent-based spin coating, RIE | Nanostructures | Borosilicate glass[ | 58.9 | 12.6 | 108 | >93.5 | 400-1800 | |
|
| Magnetron sputtering | TiO2 | Soda-lime glass | 18 | 5, | >65 | 400-1100 | ||
|
| Reactive magnetron sputtering | SiO2/TiO2 bilayer | Quartz glass | 3.29 | 46.44 | >63 | 400-1000 | ||
|
| Hydrothermal synthesis | NH4OH | glass | <5 | ~100 | 98.4 | 500 |
Abbreviations: HDPE, high-density polyethylene; GLAD, glancing angle deposition technique; DEA, diethanolamine; ICP, inductively coupled plasma; RIE, reactive ion etching; PVD, physical vapor deposition; MPII, metal plasma ion implantation.
The material after a “+” sign in the material column indicates that the material is added to the precursor solution. A “−” sign indicates that the original substance is doped by the material that follows. Some entries are intentionally left blank as the literature did not provide information on those aspects.
BOROFLOAT 33, Schott.
Summary of Found (Super)hydrophobic Surfaces in the Literature[a].
| Reference | Method | Material | Substrate | WCA Substrate (°) | WCA (°) | Sliding Angle (°) | Film Thickness (nm) | Transmittance (%] | Wavelength (nm) |
|---|---|---|---|---|---|---|---|---|---|
|
| PECVD | Carbon nanotubes | Glass | 141 | 0-40 | 300-1100 | |||
|
| Sol-gel dip coating | SNPs/PTFE | Soda-lime glass | 169 ± 2 | ≤2 | 200 | >94.9 | 500-750 | |
|
| sol-gel dip coating | SNPs/silica aerogel/PTFE | soda-lime glass | 158 ± 2 | <5 | 255 | ~99 | 650-750 | |
|
| Sol-gel dip coating | MTMS/TEOS | Glass | 30 ± 1 | 135 ± 2 | <5 | 730.8 | ||
|
| CCVD | SiO2 | Glass | 109 | 170 | <5 | >94 | 400-700 | |
|
| Sol-gel dip coating | TiO2 + DDA | Glass | 35 ± 4 | 155.5 ± 1.2 | 10 | >85 | 350-800 | |
|
| NIL + ICP | Nanosized patterns | Glass | 156/122 (oil) | 200-300 | >94.5 | 400-700 | ||
|
| Layer-by-layer assembly | PDDA/SiO2 nanoparticles | Soda-lime glass | 104 | 130 | 26 | 120 | >91.5 | 400-800 |
|
| Vertically oriented rutile nanorods | Glass | 118 | >70 | 520-800 | ||||
|
| Spin-and-spray assembly | Solid SNPs, stearic acid, POTS | Fresnel lenses | 151.5 ± 1.5 | <5 | >97.5 | 400-800 |
Abbreviations: PECVD, plasma enhanced chemical vapor deposition, SNPs, silica nanoparticles; PTFE, polytetrafluoroethylene; MTMS, methyltrimethoxysilane; TEOS, tetraethoxysilane; CCVD, combustion chemical vapor deposition; DDA, dodecylamine; NIL, nanoimprint lithography; ICP, inductively coupled plasma dry etching; PDDA, poly(diallyladimethylammoniumchloride); POTS, 1H,1H,2H,2H-perfluorooctyltriethoxysilane.
The material after a “+” sign in the material column indicates that the material is added to the precursor solution. Some entries are intentionally left blank as the literature did not provide information on those aspects.