Literature DB >> 28492652

Low energy electron-induced decomposition of (η3-C3H5)Ru(CO)3Br, a potential focused electron beam induced deposition precursor with a heteroleptic ligand set.

Rachel M Thorman1, Joseph A Brannaka, Lisa McElwee-White, Oddur Ingólfsson.   

Abstract

Here we describe in detail low energy electron induced fragmentation of a potential focused electron beam induced deposition (FEBID) precursor, π-allyl ruthenium tricarbonyl bromide, i.e. (η3-C3H5)Ru(CO)3Br, specially designed to allow comparison of the effect of different ligands on the efficiency of low energy electron induced fragmentation of FEBID precursors. Specifically, we discuss the efficiency of dissociative electron attachment (DEA) and dissociative ionization (DI) with respect to electron-induced removal of the allyl, bromide and carbonyl ligands. We place this in perspective with a previous surface study on the same precursor and we propose a design strategy for FEBID precursor molecules to increase their susceptibility towards DEA.

Entities:  

Year:  2017        PMID: 28492652     DOI: 10.1039/c7cp01696d

Source DB:  PubMed          Journal:  Phys Chem Chem Phys        ISSN: 1463-9076            Impact factor:   3.676


  5 in total

1.  Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl.

Authors:  Janina Kopyra; Paulina Maciejewska; Jelena Maljković
Journal:  Beilstein J Nanotechnol       Date:  2017-10-30       Impact factor: 3.649

2.  Electron interactions with the heteronuclear carbonyl precursor H2FeRu3(CO)13 and comparison with HFeCo3(CO)12: from fundamental gas phase and surface science studies to focused electron beam induced deposition.

Authors:  Ragesh Kumar T P; Paul Weirich; Lukas Hrachowina; Marc Hanefeld; Ragnar Bjornsson; Helgi Rafn Hrodmarsson; Sven Barth; D Howard Fairbrother; Michael Huth; Oddur Ingólfsson
Journal:  Beilstein J Nanotechnol       Date:  2018-02-14       Impact factor: 3.649

3.  Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process.

Authors:  Ragesh Kumar T P; Sangeetha Hari; Krishna K Damodaran; Oddur Ingólfsson; Cornelis W Hagen
Journal:  Beilstein J Nanotechnol       Date:  2017-11-10       Impact factor: 3.649

4.  Low-energy electron interaction and focused electron beam-induced deposition of molybdenum hexacarbonyl (Mo(CO)6).

Authors:  Po-Yuan Shih; Maicol Cipriani; Christian Felix Hermanns; Jens Oster; Klaus Edinger; Armin Gölzhäuser; Oddur Ingólfsson
Journal:  Beilstein J Nanotechnol       Date:  2022-02-04       Impact factor: 3.649

5.  In Situ Time-of-Flight Mass Spectrometry of Ionic Fragments Induced by Focused Electron Beam Irradiation: Investigation of Electron Driven Surface Chemistry inside an SEM under High Vacuum.

Authors:  Jakub Jurczyk; Lex Pillatsch; Luisa Berger; Agnieszka Priebe; Katarzyna Madajska; Czesław Kapusta; Iwona B Szymańska; Johann Michler; Ivo Utke
Journal:  Nanomaterials (Basel)       Date:  2022-08-06       Impact factor: 5.719

  5 in total

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