| Literature DB >> 28482648 |
Xiaodan Wang1,2, Sonia Estradé3, Yuanjing Lin4, Feng Yu5,6, Lluis Lopez-Conesa3, Hao Zhou5,6, Sanjeev Kumar Gurram7, Francesca Peiró3, Zhiyong Fan4, Hao Shen8,9, Lothar Schaefer7, Guenter Braeuer7, Andreas Waag10,11.
Abstract
Recently, colored H-doped TiO2 (H-TiO2) has demonstrated enhanced photoelectrochemical (PEC) performance due to its unique crystalline core-disordered shell nanostructures and consequent enhanced conduction behaviors between the core-shell homo-interfaces. Although various hydrogenation approaches to obtain H-TiO2 have been developed, such as high temperature hydrogen furnace tube annealing, high pressure hydrogen annealing, hydrogen-plasma assisted reaction, aluminum reduction and electrochemical reduction etc., there is still a lack of a hydrogenation approach in a controlled manner where all processing parameters (temperature, time and hydrogen flux) were precisely controlled in order to improve the PEC performance of H-TiO2 and understand the physical insight of enhanced PEC performance. Here, we report for the first time a controlled and local rapid thermal annealing (RTA) approach to prepare hydrogenated core-shell H-TiO2 nanorods grown on F:SnO2 (FTO) substrate in order to address the degradation issue of FTO in the typical TiO2 nanorods/FTO system observed in the conventional non-RTA treated approaches. Without the FTO degradation in the RTA approach, we systematically studied the intrinsic relationship between the annealing temperature, structural, optical, and photoelectrochemical properties in order to understand the role of the disordered shell on the improved photoelectrochemical behavior of H-TiO2 nanorods. Our investigation shows that the improvement of PEC performance could be attributed to (i) band gap narrowing from 3.0 to 2.9 eV; (ii) improved optical absorption in the visible range induced by the three-dimensional (3D) morphology and rough surface of the disordered shell; (iii) increased proper donor density; (iv) enhanced electron-hole separation and injection efficiency due to the formation of disordered shell after hydrogenation. The RTA approach developed here can be used as a suitable hydrogenation process for TiO2 nanorods/FTO system for important applications such as photocatalysis, hydrogen generation from water splitting and solar energy conversion.Entities:
Keywords: H-TiO2 core-shell nanorods; Hydrogenation; Optical absorption; PEC property; Rapid thermal annealing; TEM/EELS
Year: 2017 PMID: 28482648 PMCID: PMC5419951 DOI: 10.1186/s11671-017-2105-x
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Fig. 1Schematic of hydrogenation of TiO2 nanorods by rapid thermal annealing (RTA) with controlled temperature recipe
Fig. 2SEM images of (a) as-prepared TiO2 and (b) H-TiO2 nanorods treated at 400 °C. c XRD patterns of H-TiO2 nanorods treated at different temperatures
Fig. 3TEM, HR-TEM and FFT images of (a–c) as-prepared TiO2 nanorods and H-TiO2 treated at 400 °C (d–f) and 450 °C (g–i). The scale bar of Figs. 3 a, d, g is 50 nm whereas the scale bar of Figs. 3 b, e, h is 5 nm
Fig. 4J-V curves of pristine TiO2 and H-TiO2 nanorods in 1 M KOH solution in the dark and under solar illumination (light)
Fig. 5IPCE spectra of pristine TiO2 and H-TiO2 nanorods measured at the bias potential 0.23 V vs. Ag/AgCl
Fig. 6Mott-Schottky plots of pristine TiO2 and H-TiO2 nanorods
Fig. 7Sheet resistances of FTO and RTA treated FTO substrates compared with literature
Scheme 1Light absorption and carrier charge transport in (a) 2D TiO2 film; (b) untreated 3D TiO2 nanorods and (c) 3D H-TiO2 nanorods, the outmost disordered shell is drawn with black line and the enhanced light scattering is marked with thick arrows. Relation between the diameter d of nanorods and the depletion region width W: (d) d > > W; (e) d > W and (f) d ~ W
RTA vs. conventional hydrogen gas annealing
| Hydrogenation methods | Conventional hydrogen gas annealing | RTA |
|---|---|---|
| Chamber | Small sized samples | Small and large scaled samples (<4”) |
| Ramping/cooling time | ~ Several hours | ~ Several seconds or minutes |
| Holding time | ~0.5-1 h | ~1 h |
| Sheet resistance of FTO | Increased with increased annealing temperatures | Unchanged with increased annealing temperatures |
| Achieved photocurrent density (mA/cm2) at 0.23 V versus Ag/AgCl | 2.5 (Ref.4) | 3.7 (This work) |