Literature DB >> 28381003

Ge-rich graded-index Si<sub>1-</sub>xGex waveguides with broadband tight mode confinement and flat anomalous dispersion for nonlinear mid-infrared photonics.

J M Ramirez, V Vakarin, J Frigerio, P Chaisakul, D Chrastina, X Le Roux, A Ballabio, L Vivien, G Isella, D Marris-Morini.   

Abstract

This work explores the use of Ge-rich graded-index Si<sub>1-</sub>xGex rib waveguides as building blocks to develop integrated nonlinear optical devices for broadband operation in the mid-IR. The vertical Ge gradient concentration in the waveguide core renders unique properties to the guided optical mode, providing tight mode confinement over a broadband mid-IR wavelength range from λ = 3 µm to 8 µm. Additionally, the gradual vertical confinement pulls the optical mode upwards in the waveguide core, overlapping with the Ge-rich area where the nonlinear refractive index is larger. Moreover, the Ge-rich graded-index Si<sub>1-</sub>xGex waveguides allow efficient tailoring of the chromatic dispersion curves, achieving flat anomalous dispersion for the quasi-TM optical mode with D ≤ 14 ps/nm/km over a ~1.4 octave span while retaining an optimum third-order nonlinear parameter, γeff. These results confirm the potential of Ge-rich graded-index Si<sub>1-</sub>xGex waveguides as an attractive platform to develop mid-IR nonlinear approaches requiring broadband dispersion engineering.

Year:  2017        PMID: 28381003     DOI: 10.1364/OE.25.006561

Source DB:  PubMed          Journal:  Opt Express        ISSN: 1094-4087            Impact factor:   3.894


  4 in total

1.  On-Chip Mid-Infrared Supercontinuum Generation from 3 to 13 μm Wavelength.

Authors:  Miguel Montesinos-Ballester; Christian Lafforgue; Jacopo Frigerio; Andrea Ballabio; Vladyslav Vakarin; Qiankun Liu; Joan Manel Ramirez; Xavier Le Roux; David Bouville; Andrea Barzaghi; Carlos Alonso-Ramos; Laurent Vivien; Giovanni Isella; Delphine Marris-Morini
Journal:  ACS Photonics       Date:  2020-11-11       Impact factor: 7.529

2.  Self-Assembly of Nanovoids in Si Microcrystals Epitaxially Grown on Deeply Patterned Substrates.

Authors:  Andrea Barzaghi; Saleh Firoozabadi; Marco Salvalaglio; Roberto Bergamaschini; Andrea Ballabio; Andreas Beyer; Marco Albani; Joao Valente; Axel Voigt; Douglas J Paul; Leo Miglio; Francesco Montalenti; Kerstin Volz; Giovanni Isella
Journal:  Cryst Growth Des       Date:  2020-04-08       Impact factor: 4.076

3.  Nanoscale growth of a Sn-guided SiGeSn alloy on Si (111) substrates by molecular beam epitaxy.

Authors:  Liming Wang; Yichi Zhang; Hao Sun; Jie You; Yuanhao Miao; Zuoru Dong; Tao Liu; Zuimin Jiang; Huiyong Hu
Journal:  Nanoscale Adv       Date:  2020-11-19

4.  Nonlinear Properties of Ge-rich Si1-xGex Materials with Different Ge Concentrations.

Authors:  Samuel Serna; Vladyslav Vakarin; Joan-Manel Ramirez; Jacopo Frigerio; Andrea Ballabio; Xavier Le Roux; Laurent Vivien; Giovanni Isella; Eric Cassan; Nicolas Dubreuil; Delphine Marris-Morini
Journal:  Sci Rep       Date:  2017-11-07       Impact factor: 4.379

  4 in total

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