Literature DB >> 28361531

Photocatalytic Anatase TiO2 Thin Films on Polymer Optical Fiber Using Atmospheric-Pressure Plasma.

Kamal Baba1, Simon Bulou1, Patrick Choquet1, Nicolas D Boscher1.   

Abstract

Due to the undeniable industrial advantages of low-temperature atmospheric-pressure plasma processes, such as low cost, low temperature, easy implementation, and in-line process capabilities, they have become the most promising next-generation candidate system for replacing thermal chemical vapor deposition or wet chemical processes for the deposition of functional coatings. In the work detailed in this article, photocatalytic anatase TiO2 thin films were deposited at a low temperature on polymer optical fibers using an atmospheric-pressure plasma process. This method overcomes the challenge of forming crystalline transition metal oxide coatings on polymer substrates by using a dry and up-scalable method. The careful selection of the plasma source and the titanium precursor, i.e., titanium ethoxide with a short alkoxy group, allowed the deposition of well-adherent, dense, and crystalline TiO2 coatings at low substrate temperature. Raman and XRD investigations showed that the addition of oxygen to the precursor's carrier gas resulted in a further increase of the film's crystallinity. Furthermore, the films deposited in the presence of oxygen exhibited a better photocatalytic activity toward methylene blue degradation assumedly due to their higher amount of photoactive {101} facets.

Entities:  

Keywords:  anatase TiO2; atmospheric-pressure plasma deposition; photocatalysis; side-glowing polymer optical fiber; temperature-sensitive substrate

Year:  2017        PMID: 28361531     DOI: 10.1021/acsami.7b01398

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  3 in total

1.  Transparent anti-fogging and self-cleaning TiO2/SiO2 thin films on polymer substrates using atmospheric plasma.

Authors:  Jean-Baptiste Chemin; Simon Bulou; Kamal Baba; Charly Fontaine; Thierry Sindzingre; Nicolas D Boscher; Patrick Choquet
Journal:  Sci Rep       Date:  2018-06-25       Impact factor: 4.379

2.  Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films.

Authors:  Seongchan Kang; Rodolphe Mauchauffé; Yong Sung You; Se Youn Moon
Journal:  Sci Rep       Date:  2018-11-12       Impact factor: 4.379

3.  Anatase TiO2 deposited at low temperature by pulsing an electron cyclotron wave resonance plasma source.

Authors:  B Dey; S Bulou; T Gaulain; W Ravisy; M Richard-Plouet; A Goullet; A Granier; P Choquet
Journal:  Sci Rep       Date:  2020-12-15       Impact factor: 4.379

  3 in total

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