| Literature DB >> 28326231 |
Aurora Piazza1, Filippo Giannazzo2, Gianpiero Buscarino3, Gabriele Fisichella2, Antonino La Magna2, Fabrizio Roccaforte2, Marco Cannas3, Franco Mario Gelardi3, Simonpietro Agnello4.
Abstract
The effects of temperature and atmosphere (air and O2) on the doping of monolayers of graphene (Gr) on SiO2 and Si substrates, and on the doping of MoS2 multilayer flakes transferred on the same substrates have been investigated. The investigations were carried out by in situ micro-Raman spectroscopy during thermal treatments up to 430 °C, and by atomic force microscopy (AFM). The spectral positions of the G and 2D Raman bands of Gr undergo only minor changes during treatment, while their amplitude and full width at half maximum (FWHM) vary as a function of the temperature and the used atmosphere. The thermal treatments in oxygen atmosphere show, in addition to a thermal effect, an effect attributable to a p-type doping through oxygen. The thermal broadening of the line shape, found during thermal treatments by in situ Raman measurements, can be related to thermal phonon effects. The absence of a band shift results from the balance between a red shift due to thermal effects and a blue shift induced by doping. This shows the potential of in situ measurements to follow the doping kinetics. The treatment of MoS2 in O2 has evidenced a progressive erosion of the flakes without relevant spectral changes in their central zone during in situ measurements. The formation of MoO3 on the edges of the flakes is observed indicative of the oxygen-activated transformation.Entities:
Keywords: MoS2; Raman spectroscopy; graphene; thermal doping; two-dimensional (2D) materials
Year: 2017 PMID: 28326231 PMCID: PMC5331249 DOI: 10.3762/bjnano.8.44
Source DB: PubMed Journal: Beilstein J Nanotechnol ISSN: 2190-4286 Impact factor: 3.649
Figure 1(a) AFM morphology image and (b) micro-Raman spectra of the as transferred graphene on SiO2 substrate on Si.
Figure 2(Top) Comparison of the in situ Raman spectra of a Gr sample as transferred and subsequently treated in air, the temperature varies from 100 to 300 °C. The reported time is the elapsed time from the treatment beginning at the given temperature, the top spectrum is acquired after decreasing the temperature. Spectra have been arbitrarily vertically shifted for clearness. (Bottom) Measured FWHM of the 2D band as a function of the temperature.
Figure 3(Top) Comparison of the in situ Raman spectra of a Gr sample as transferred and subsequently treated in O2, at a pressure of 2 bar and at temperatures of 300 and 350 °C. The reported time is the elapsed time from the treatment beginning at the given temperature. Spectra have been arbitrarily vertically shifted for clearness. (Bottom) Trend of the FWHM of the 2D band as a function of the temperature. The dashed line indicates the maximum value of the FWHM of the 2D band obtained by the treatment in air (see Figure 2).
Figure 4Correlation map of the 2D and G peak positions measured at room temperature in the Gr/SiO2/Si samples as transferred and thermally treated selectively in air and in O2. The full line marks the stress limit and the dashed line the doping limit as reported in [30].
Figure 5In situ Raman spectra of MoS2 before thermal treatments (bottom), after thermal treatment in O2 at 300 °C (middle) and 400 °C (top). Spectra are vertically shifted for the sake of comparison.
Figure 6MoS2 flake after the thermal treatment up to 430 °C in O2; optical microscopy (left) and AFM (right) images.
Figure 7Ex situ Raman spectra of MoS2 before thermal treatment (bottom line), after thermal treatment in O2 at T < 430°C in the center of a flake (middle) and on the edge of a flake (top). Spectra are vertically shifted for the sake of comparison.