| Literature DB >> 28300178 |
Er-Tao Hu1,2, Yuan Yao2, Kai-Yan Zang2, Xin-Xing Liu1, An-Qing Jiang3, Jia-Jin Zheng1, Ke-Han Yu1, Wei Wei1, Yu-Xiang Zheng2, Rong-Jun Zhang2, Song-You Wang2, Hai-Bin Zhao2, Osamu Yoshie3, Young-Pak Lee4, Cai-Zhuang Wang5, David W Lynch5, Jun-Peng Guo6, Liang-Yao Chen2.
Abstract
In this work, 4-layered SiO2/Bi2Te3/SiO2/Cu film structures were designed and fabricated and the optical properties investigated in the wavelength region of 250-1200 nm for their promising applications for direct solar-thermal-electric conversion. A typical 4-layered film sample with the structure SiO2 (66.6 nm)/Bi2Te3 (7.0 nm)/SiO2 (67.0 nm)/Cu (>100.0 nm) was deposited on a Si or K9-glass substrate by magnetron sputtering. The experimental results agree well with the simulated ones showing an average optical absorption of 96.5%, except in the shorter wavelength region, 250-500 nm, which demonstrates the superior absorption property of the 4-layered film due to the randomly rough surface of the Cu layer resulting from the higher deposition power. The high reflectance of the film structure in the long wavelength region of 2-20 μm will result in a low thermal emittance, 0.064 at 600 K. The simpler 4-layered structure with the thermoelectric Bi2Te3 used as the absorption layer may provide a straightforward way to obtain solar-thermal-electric conversion more efficiently through future study.Entities:
Year: 2017 PMID: 28300178 PMCID: PMC5353569 DOI: 10.1038/srep44614
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Simulated spectra for absorptance, transmittance and reflectance of the 4-layered film structure for normal incidence.
The spectrum of absorptance (solid line) is calculated with the optical constants obtained from the thin Bi2Te3 film. The inset shows the electric field distribution (λ = 500 nm) of the 4-layered film structure.
Figure 2Measured spectra of the absorptance, transmittance and reflectance under the near normal-incidence condition for the samples in the wavelength region of 250–1200 nm as compared with the simulated one.
Figure 3Measured absorptance spectra of the samples under the near normal-incidence condition with different deposition power for the Cu layers (the solid line represents the simulated absorptance spectra).
Figure 4AFM images for the Cu layers deposited under different power conditions (a) 50 W, (b) 100 W.
Figure 5Measured reflectance spectra for the Cu layers deposited under different power.
Figure 6The measured reflectance spectrum of the 4-layered film sample in the 2–20 μm wavelength region.
Thermal emittance ε (0, T) reduced by using the measured reflectance spectra under nearly normal incidence condition.
| 300 | 400 | 500 | 600 | |
|---|---|---|---|---|
| 0.013 | 0.023 | 0.039 | 0.064 |