| Literature DB >> 28300133 |
D Maryenko1, A S Mishchenko1, M S Bahramy1,2, A Ernst3,4, J Falson2, Y Kozuka2, A Tsukazaki5, N Nagaosa1,2, M Kawasaki1,2.
Abstract
Anomalous Hall effect, a manifestation of Hall effect occurring in systems without time-reversal symmetry, has been mostly observed in ferromagnetically ordered materials. However, its realization in high-mobility two-dimensional electron system remains elusive, as the incorporation of magnetic moments deteriorates the device performance compared to non-doped structure. Here we observe systematic emergence of anomalous Hall effect in various MgZnO/ZnO heterostructures that exhibit quantum Hall effect. At low temperatures, our nominally non-magnetic heterostructures display an anomalous Hall effect response similar to that of a clean ferromagnetic metal, while keeping a large anomalous Hall effect angle θAHE≈20°. Such a behaviour is consistent with Giovannini-Kondo model in which the anomalous Hall effect arises from the skew scattering of electrons by localized paramagnetic centres. Our study unveils a new aspect of many-body interactions in two-dimensional electron systems and shows how the anomalous Hall effect can emerge in a non-magnetic system.Entities:
Year: 2017 PMID: 28300133 PMCID: PMC5357314 DOI: 10.1038/ncomms14777
Source DB: PubMed Journal: Nat Commun ISSN: 2041-1723 Impact factor: 14.919
Figure 1Concept of anomalous Hall effect.
(a) Hall voltage is built in the magnetic field B due to the Lorentz force (left panel) and due to the spin–orbit coupling in ferromagnetic material with the total magnetization M (right panel). (b) Appearance of anomalous Hall effect: electrons are deflected in the mean field of spontaneously ordered magnetic moments. (c) Anomalous Hall effect in a paramagnetic system, such as ZnO, is brought about by the spin-dependent electron scattering on localized magnetic moment J. (d) Schematic representation of anomalous Hall effect scaling behaviour found in various materials67.
Figure 2Sample characteristics establish the anomalous Hall effect.
(a) Magnetotransport R and R at two representative temperatures. (b) Anomalous Hall effect component at different temperatures. The Landau level integer filling factors ν becomes visible at T<8 K. (c) Temperature dependence of the charge carrier density extracted from the ordinary Hall effect in high field. (d) Four-point resistance R as a function of temperature. (e) Temperature dependence of the saturated value of anomalous Hall effect resistance . (f) AHE scaling: ∝. α=0.94±0.08 is observed between 2 and 10 K, whereas α>1 at higher temperature. (g) AHE angle increases with the decreasing temperature.
Figure 3Magnetic characteristics deduced from electrical transport.
(a) Temperature dependence of the anomalous Hall effect normalized to the saturated value of AHE. Such a representation makes apparent the similarity with the magnetization behaviour of a paramagnetic system. The Brillouin function describes well the field dependence of AHE. (b) Left axis: temperature dependence of μB obtained from the fitting the AHE traces in a with the Brillouin function. Right axis: temperature dependence of the slope of AHE around B=0 in a. (c) Magnetic susceptibility χ obtained from the slope of AHE and temperature dependence μB. For T<10 K, the dependence of 1/χ on T can be approximated with the Curie–Weiss law (black line).
Figure 4Anomalous Hall effect scaling.
(a) Scaling of anomalous Hall effect ∝ with α=1 (blue solid line) at low temperature is observed for structures covering a wide range of charge carrier density. For clarity of representation, for each sample is multiplied by a factor shown in the box. α increases at elevated temperature. (b) The inverse spin-susceptibility 1/χ peaks at some temperature indicated by solid symbol (except the highest density sample) and suggests the change in the system's magnetic property. This transition temperature is higher for higher carrier density samples and correlates with the temperature at which α starts deviating from 1, except the samples E–G with the higher carrier concentration. At low temperature, 1/χ versus T dependence can be approximated with the Curie–Weiss law with a characteristic temperature Tcw. (c) Temperature dependence of AHE angle for all samples. The AHE angle lies in the range between tan(θAHE)=0.3 and tan(θAHE)=0.5 at T=2 K, indicating a non-vanishing AHE at low temperature. (d) Tcw increases with the increasing carrier density. Error bar is given by the uncertainty with which the linear dependence 1/χ versus T can be approximated in b.
Samples summary.
| 273 | 3.4 | 2 × 106 | 750 | 300 |
| 429 | 6.7 | 6 × 106 | 750 | 140 |
| 430 | 13 | 6 × 106 | 750 | 130 |
| 431 | 11 | 6 × 106 | 750 | 140 |
| 443 | 18 | 1 × 105 | 750 | 230 |
| 454 | 1.7 | 1 × 105 | 750 | 250 |
| 504 | 2.3 | 2 × 105 | 750 | 780 |
n is the charge carrier density at T=2 K, is the ozone pressure for the growth, Tgrowth is the growth temperature and dMgZnO is the thickness of MgZnO layer. All heterostructures are grown on ZnO substrate.