| Literature DB >> 28225028 |
Tao Zhang1,2, Deng-Ke Wang1,2, Nan Jiang1,2, Zheng-Hong Lu1,2,3.
Abstract
Tandem device is an important architecture in fabricating high performance organic light-emitting diodes and organic photovoltaic cells. The key element in making a high performance tandem device is the connecting materials stack, which plays an important role in electric field distribution, charge generation and charge injection. For a tandem organic light-emitting diode (OLED) with a simple Liq/Al/MoO3 stack, we discovered that there is a significant current lateral spreading causing light emission over an extremely large area outside the OLED pixel when the Al thickness exceeds 2 nm. This spread light emission, caused by an inductive electric field over one of the device unit, limits one's ability to fabricate high performance tandem devices. To resolve this issue, a new connecting materials stack with a C60 fullerene buffer layer is reported. This new structure permits optimization of the Al metal layer in the connecting stack and thus enables us to fabricate an efficient tandem OLED having a high 155.6 cd/A current efficiency and a low roll-off (or droop) in current efficiency.Entities:
Year: 2017 PMID: 28225028 PMCID: PMC5320488 DOI: 10.1038/srep43130
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Schematic illustration of a tandem device with (a) a CGL having no lateral electrical conduction and (b) a CGL having lateral electrical conduction.
Structures of the various test OLED devices.
| Device ID | Unit One | CGL | Unit Two |
|---|---|---|---|
| Device A | EL-G | Liq(1 nm)/Al(x=1–3 nm)/MoO3(10 nm) | EL-G |
| Device B | Liq(1 nm)/Al(2 nm)/MoO3(10 nm) | EL-R | |
| Device C | Liq(1 nm)/Al(1.5 nm)/MoO3 (10 nm) | EL-G | |
| Device D | Liq(1 nm)/Al(1.5 nm)/C60(2 nm)/MoO3(10 nm) | ||
| Device E | Liq(1 nm)/Al(1.5 nm)/C60(2 nm)/CBP:MoO3(50 wt.%, 10 nm) | ||
| Device F | Liq(1 nm)/Al(3 nm)/C60(2 nm)/CBP:MoO3(50 wt.%, 10 nm) | ||
| Single EL | ITO/MoO3(1 nm)/EL-G/LiF(1 nm)/Al(100 nm) | ||
| EL-G | CBP(20 nm)/CBP:Ir(ppy)2(acac)(8 wt.%, 30 nm)/TPBi (65 nm) | ||
| EL-R | CBP(20 nm)/CBP:Ir(piq)2(acac)(5 wt.%, 30 nm)/TPBi(65 nm) | ||
The general structure is ITO/MoO3(1 nm)/Unit One/CGL/Unit Two/LiF(1 nm)/Al(100 nm).
Figure 2(a) Schematic device structure. (b) photograph picture of the device-A with 1 nm Al layer (top panel); photograph picture of the device-A with 2 nm Al layer (mid panel); photograph picture of the device-B with 2 nm Al layer (bottom panel).
Figure 3(a) L–I–V, (b) current and power efficiency-luminance characteristics of device-A with various thicknesses of Al layer.
Figure 4(a) The working mechanism model of the tandem device-A with Liq/Al/MoO3, the MoO3–x denote the oxygen-deficient MoO3, the arrows denote the current direction in the working device. (b) Cross-section of OLED device with Al cathode and intermediate metallic or semimetallic material MoO3–x layer as bottom electrode. (c) Comparison of measurement and simulation for the luminance - distance characteristic for device-A with 2 nm Al.
Figure 5(a) Current density–voltage (J-V), (b) Current efficiency–luminance characteristics of single EL unit device and tandem devices C-F with different CGL. The device configurations are shown in Table 1.
Figure 6(a) EL spectra, (b) Measured and Lambertian (dashed line) angular distributions of the luminance (normalized to 0° intensity) for the single EL unit device and device-F.