| Literature DB >> 28179786 |
Abstract
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Year: 1990 PMID: 28179786 PMCID: PMC4922408 DOI: 10.6028/jres.095.037
Source DB: PubMed Journal: J Res Natl Inst Stand Technol ISSN: 1044-677X
Some representative narrow-gap semiconductors
| Elements | Compounds | Alloys | ||||
|---|---|---|---|---|---|---|
| II–V | II–VI | III–V | IV–VI | V–VI | ||
| Tellurium | BaAs3 | HgS | InSb | PbS | Bi2Se3 | Hg1− |
| Selenium | CaAs3 | HgSe | InAs | PbSe | Bi2Te3 | Hg1− |
| Gray Tin | Cd3As2 | HgTe | PbTe | Sb2Se3 | Hg1− | |
| Cd3P2 | SnTe | Sb2Te3 | Hg1− | |||
| GeTe | Hg1− | |||||
| Zn3As2 | Hg1− | |||||
| Zn3P2 | Hg1− | |||||
| HgS | ||||||
| Pb1− | ||||||
| II–IV–V | II–IV | PbS1− | ||||
| CdSnAs2 | Mg2Sn | Pb1− | ||||
| Pb1− | ||||||
| Superlattices and Quantum Wells | PbSe | |||||
| (Many combinations from the above lists, such as HgTe/CdTe, InAs/In1− | Cd3− | |||||
| (Cd1− | ||||||
| Pb1− | ||||||
| InAs | ||||||
| Pb1− | ||||||
| Pb1− | ||||||
| Pb1− | ||||||
| Pb1− | ||||||
| Pb1− | ||||||
| Pb1− | ||||||
| Pb1− | ||||||
Previous conferences on narrow-gap semiconductors
| Date | Place | Sponsors and financial support | Publication |
|---|---|---|---|
| Jan. 21, 1964 | Columbia Univ., New York | Topical Conference APS | Proc. of Conf. on The Physics of Semimetals published in IBM J. Res. Dev., Vol. 8, 1964. One paper on IV–VI Compounds. |
| April 2–4, 1968 | Univ. of Durham, England | Short report of Semimetals and Narrow-Gap Semiconductors Conference given by G. A. Saunders, in J. Phys., Colloque C4, Supp. to #11–12, Vol. 29, pp. 3–8, 1968. | |
| July 15–18, 1968 | Centre National de la Recherche Scientifique, Paris, France | C.N.R.S. | International Colloquium on IV–VI Compounds, J. Phys., Colloque C4, Supp. to #11–12, Vol. 29, 1968. |
| Mar. 20–21, 1970 | Dallas, TX, USA | Texas Instruments, ONR, LTV Research Center, Topical Conf. of APS | Physics of Semimetals and Narrow-Gap Semiconductors Conference proceedings published in J. Phys. Chem. Solid, Vol. 32, Suppl. 1, 1971, pp. 1–568. |
| Mar. 24–25, 1972 | Univ. of Pennsylvania, Philadephia, PA | Moore School of EE, Lab. for Res. on Struct. of Mat., Topical Conf. of APS | Physics of IV–VI Compounds and Alloys (Gordon & Breach, London, 1974). |
| Sept. 10–14, 1973 | Nice, France Cardiff, Wales | Royal Society, Plessey Co. Limited, C.N.R.S. | Int. Conf. on The Physics of Semimetals and Narrow-Gap Semiconductors. Proceedings unpublished. |
| Sept. 12–15, 1977 | Institute of Physics, Polish Academy of Sciences, Warsaw, Poland | Recognized by the Int. Union of Pure and Applied Physics (IUPAP) | Conf. Proc. published as Phys. of Narrow Gap Semicond. (PWN-Polish Scientific Publishing, Warsaw, 1978), pp. 1–481 |
| Sept. 3–15, 1979 | Université des Sciences et Techniques du Languedoc, Nimes, France | Various institutions and companies including European Research Office, IBM, ONR, Thomson CSF | Int. Summer School Proc. published as Narrow-Gap Semiconductors Physics and Applications, Lecture Notes in Physics, Vol. 133 (Springer-Verlag, New York, 1980), pp. 1–572. |
| Sept. 14–17, 1981 | Johannes Kepler Univ., Linz, Austria | IUPAP, European Phys. Soc. Austrian Phys. Soc., IBM, Siemens, European Research Office, Austrian Fed. Ministry of Science and Research | Conf. Proc. published as Physics of Narrow-Gap Semiconductors, Lecture Notes in Physics, Vol. 152 (Springer-Verlag, New York, 1982), pp. 1–485. |
Figure 1Schematic illustration of the InAsSb strained-layer-superlattice photodiodes fabricated at Sandia National Labs (see Conference paper of G. C. Osbourn, fig. 3). The SL is grown on a p-type InSb substrate with an intervening InAsSb graded buffer layer. As shown, the pn junction occurs within the SL structure. These SL materials can be used as direct replacements for bulk materials in standard photovoltaic or photoconductive device structures.
Figure 2Comparison of three epitaxial growth techniques: liquid phase epitaxy (LPE), hot wall epitaxy (HWE), and molecular beam epitaxy (MBE) (see Conference paper by H. Preier, fig. 3). In the LPE method, growth occurs by controlled lowering of the melt temperature. No MQW and single QW structures can be produced by the LPE method. The HWE method is a vapor-phase epitaxy technique where substrate and source form a quasi-enclosed system. Layer structures are grown by positioning the heated substrate on top of different source furnace arrangements. As shown in the diagram, PbTe layers can be grown on the right side and PbEuTe layers on the left side. The temperature of the Eu furnace controls the Eu content, that of the Te furnace the doping concentration. Multiple-layer structures can be produced by switching the substrate back and forth. Using the MBE method, layers of various compositions can be deposited by properly combining molecular beams from different source ovens.
Figure 3Schematic view of a typical device structure of an MBE grown PbEuSeTe/PbTe double heterostructure laser grown at Laser Analytics (see Conference paper by H. Preier, fig. 3). Note that metal contacts have to be applied only to heavily doped PbTe and that the current is restricted to a narrow stripe region by mesa etching.
Figure 4Example of the use of x-ray diffraction techniques to characterize MBE-grown SL structures. X-ray diffraction Bragg intensities versus angle of incidence for a Pb1−MnsTe structure (x = 0.027, 20 periods tpbTe = 4.5 nm, tPbMnTe = 30 nm) (see Conference paper by G. Bauer, fig. 4). The experimental data compare favorably with the calculated intensities shown below each data curve. The influence of the annealing time on the satellite peaks can be directly seen as discussed in the text.
Figure 5Characterization of various MBE-grown structures by photoluminescence techniques for PbTe and Pb1−MnTe films and two QW structures. The geometry of each structure is shown along with x-ray intensity versus angle data for the two QWs. As discussed in the text, these data give evidence for the quantum confinement effects that are present in certain structures.
Figure 6Example of using nonlinear optical techniques to characterize semiconductors. The CARS intensity of an n-type Hg1−CdTe sample (x =0.231) is shown versus magnetic field (see Conference paper by H. Pascher, fig. 9). Various Ramanlike resonances appear at different magnetic fields and can be used to characterize the electronic structure of the material in a contactless manner. Cyclotron resonance (CR), combined spin flip (CSF), and spin resonance (SR) structures are shown.
Figure 7Effective g-factor of a Hg1−CdTe sample (shown in fig. 6) versus magnetic field (see Conference paper by H. Pascher, fig. 10). The g-factors can be accurately calculated from the magnetic-field positions of the SR. The magnetic-field dependence of the g-factor is a direct consequence of the non-parabolic nature of the conduction band.
Figure 8Schematic cross section of the microstructure field-effect device on InSb that is used for quantum wires and quantum dots (see Conference paper by U. Merkt and Ch. Sikorski, fig. 1). Basically it is an MOS capacitor. The lower half of the figure shows the corresponding band structure and Fermi level in the device.