Literature DB >> 28118710

Universal Mechanism of Band-Gap Engineering in Transition-Metal Dichalcogenides.

Mingu Kang1, Beomyoung Kim1,2, Sae Hee Ryu1, Sung Won Jung1, Jimin Kim1, Luca Moreschini1,2, Chris Jozwiak2, Eli Rotenberg2, Aaron Bostwick2, Keun Su Kim1.   

Abstract

van der Waals two-dimensional (2D) semiconductors have emerged as a class of materials with promising device characteristics owing to the intrinsic band gap. For realistic applications, the ideal is to modify the band gap in a controlled manner by a mechanism that can be generally applied to this class of materials. Here, we report the observation of a universally tunable band gap in the family of bulk 2H transition metal dichalcogenides (TMDs) by in situ surface doping of Rb atoms. A series of angle-resolved photoemission spectra unexceptionally shows that the band gap of TMDs at the zone corners is modulated in the range of 0.8-2.0 eV, which covers a wide spectral range from visible to near-infrared, with a tendency from indirect to direct band gap. A key clue to understanding the mechanism of this band-gap engineering is provided by the spectroscopic signature of symmetry breaking and resultant spin-splitting, which can be explained by the formation of 2D electric dipole layers within the surface bilayer of TMDs. Our results establish the surface Stark effect as a universal mechanism of band-gap engineering on the basis of the strong 2D nature of van der Waals semiconductors.

Entities:  

Keywords:  Band-gap engineering; giant Stark effect; transition-metal dichalcogenides; two-dimensional semiconductors

Year:  2017        PMID: 28118710     DOI: 10.1021/acs.nanolett.6b04775

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  14 in total

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