Literature DB >> 28054680

Interfacial water on organic substrates at cryogenic temperatures: hydrogen bonding and quantification in the submonolayer regime.

D Houdoux1, J Houplin1, L Amiaud1, A Lafosse1, C Dablemont1.   

Abstract

Water molecules were used to probe the physical and chemical properties of a model hydrophilic organic organized layer. To this end, H2O adsorption on mercaptoundecanoic acid self-assembled monolayers (SAMs) was investigated at the molecular level under ultra-high vacuum by high resolution electron energy loss spectroscopy (HREELS), through the sensitivity of the water OH stretching modes to the molecular environment. The water interfacial layer formation and structure were studied upon deposition at 28 K. A direct sensitive quantification in the submonolayer regime (10-80% of completion) was achieved by the sole measurement of the OH stretching mode frequencies, and the dominant basic (-COO-)/acidic (-COOH) forms of the terminal functions could be probed. The surface densities of the water interfacial layer and the SAM terminal functions were measured independently, and demonstrated to be comparable. This means that the SAM terminal functions provided anchors for water adsorption through two hydrogen bonds and that the SAM acted as a template even at 28 K. Upon annealing at 110 K, the water molecules were observed to form clusters of higher molecular density, dewetting the supporting substrate. Finally, the vanishing of the supporting substrate vibrational signature, due to the masking effect by the deposited water layer, was used to estimate the depth probed by HREELS through water layers to be 11 ± 2 Å.

Entities:  

Year:  2017        PMID: 28054680     DOI: 10.1039/c6cp03328h

Source DB:  PubMed          Journal:  Phys Chem Chem Phys        ISSN: 1463-9076            Impact factor:   3.676


  2 in total

1.  Characterizing the bifurcating configuration of hydrogen bonding network in interfacial liquid water and its adhesion on solid surfaces.

Authors:  Lei Zhao; Jiangtao Cheng
Journal:  RSC Adv       Date:  2019-05-24       Impact factor: 4.036

2.  Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID).

Authors:  Leo Sala; Iwona B Szymańska; Céline Dablemont; Anne Lafosse; Lionel Amiaud
Journal:  Beilstein J Nanotechnol       Date:  2018-01-05       Impact factor: 3.649

  2 in total

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