| Literature DB >> 28032747 |
Youngjun Song1, Tsukasa Takahashi1, Sejung Kim1, Yvonne C Heaney1, John Warner1, Shaochen Chen1, Michael J Heller1.
Abstract
We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.Entities:
Keywords: DNA; displacer effect; patterning; photolithography; self-assembly; thymine dimer
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Year: 2016 PMID: 28032747 DOI: 10.1021/acsami.6b11361
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229