Literature DB >> 28032747

A Programmable DNA Double-Write Material: Synergy of Photolithography and Self-Assembly Nanofabrication.

Youngjun Song1, Tsukasa Takahashi1, Sejung Kim1, Yvonne C Heaney1, John Warner1, Shaochen Chen1, Michael J Heller1.   

Abstract

We demonstrate a DNA double-write process that uses UV to pattern a uniquely designed DNA write material, which produces two distinct binding identities for hybridizing two different complementary DNA sequences. The process requires no modification to the DNA by chemical reagents and allows programmed DNA self-assembly and further UV patterning in the UV exposed and nonexposed areas. Multilayered DNA patterning with hybridization of fluorescently labeled complementary DNA sequences, biotin probe/fluorescent streptavidin complexes, and DNA patterns with 500 nm line widths were all demonstrated.

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Keywords:  DNA; displacer effect; patterning; photolithography; self-assembly; thymine dimer

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Year:  2016        PMID: 28032747     DOI: 10.1021/acsami.6b11361

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  1 in total

1.  DNA multi-bit non-volatile memory and bit-shifting operations using addressable electrode arrays and electric field-induced hybridization.

Authors:  Youngjun Song; Sejung Kim; Michael J Heller; Xiaohua Huang
Journal:  Nat Commun       Date:  2018-01-18       Impact factor: 14.919

  1 in total

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