Literature DB >> 28029107

Modulation of nonlinear resistive switching behavior of a TaOx-based resistive device through interface engineering.

Zongwei Wang1, Jian Kang, Zhizhen Yu, Yichen Fang, Yaotian Ling, Yimao Cai, Ru Huang, Yangyuan Wang.   

Abstract

A resistive switching device with inherent nonlinear characteristics through a delicately engineered interfacial layer is an ideal component to be integrated into passive crossbar arrays for the suppression of sneaking current, especially in ultra-dense 3D integration. In this paper, we demonstrated a TaOx-based bipolar resistive switching device with a nearly symmetrical bi-directional nonlinear feature through interface engineering. This was accomplished by introducing an ultra-thin interfacial layer (SiO2-x) with unique features, including a large band gap and a certain level of negative heat of oxide formation between the top electrode (TiN) and resistive layer (TaOx). The devices exhibit excellent nonlinear property under both positive and negative bias. Modulation of the inherent nonlinearity as well as the resistive switching mechanism are comprehensively studied by scrutinizing the results of the experimental control groups and the extensive characterizations including detailed compositional analysis, which suggests that the underlying mechanism of the nonlinear behavior is associatively governed by the serially connected metallic conductive filament and Flower-Nordheim tunneling barrier formed by the SiO2-x interface layer. The proposed device in this work has great potential to be implemented in future massive storage memory applications of high-density selector-free crossbar structure.

Year:  2016        PMID: 28029107     DOI: 10.1088/1361-6528/28/5/055204

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  3 in total

1.  Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory.

Authors:  Sungjun Kim; Yao-Feng Chang; Min-Hwi Kim; Tae-Hyeon Kim; Yoon Kim; Byung-Gook Park
Journal:  Materials (Basel)       Date:  2017-04-26       Impact factor: 3.623

2.  Customized binary and multi-level HfO2-x-based memristors tuned by oxidation conditions.

Authors:  Weifan He; Huajun Sun; Yaxiong Zhou; Ke Lu; Kanhao Xue; Xiangshui Miao
Journal:  Sci Rep       Date:  2017-08-30       Impact factor: 4.379

3.  Dual Functions of V/SiOx/AlOy/p++Si Device as Selector and Memory.

Authors:  Sungjun Kim; Chih-Yang Lin; Min-Hwi Kim; Tae-Hyeon Kim; Hyungjin Kim; Ying-Chen Chen; Yao-Feng Chang; Byung-Gook Park
Journal:  Nanoscale Res Lett       Date:  2018-08-23       Impact factor: 4.703

  3 in total

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