| Literature DB >> 27922114 |
F D Parmentier1, T Cazimajou1, Y Sekine2, H Hibino2, H Irie2, D C Glattli1, N Kumada2, P Roulleau1.
Abstract
We have observed the well-kown quantum Hall effect (QHE) in epitaxial graphene grown on silicon carbide (SiC) by using, for the first time, only commercial NdFeB permanent magnets at low temperature. The relatively large and homogeneous magnetic field generated by the magnets, together with the high quality of the epitaxial graphene films, enables the formation of well-developed quantum Hall states at Landau level filling factors v = ±2, commonly observed with superconducting electro-magnets. Furthermore, the chirality of the QHE edge channels can be changed by a top gate. These results demonstrate that basic QHE physics are experimentally accessible in graphene for a fraction of the price of conventional setups using superconducting magnets, which greatly increases the potential of the QHE in graphene for research and applications.Entities:
Year: 2016 PMID: 27922114 PMCID: PMC5138823 DOI: 10.1038/srep38393
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Figure 1Experimental setup and sample.
(A) Schematic of the sample holder with three cylindrical NdFeB magnets generating an axial magnetic field of roughly 1 T in a Helmholtz configuration. The sample is placed between the lowermost magnet and the middle one. (B) Photograph of the setup implemented in our dry He3 fridge. (C) Optical micrograph of the graphene Hall bar sample, entirely covered by a top gate. The width of the Hall bar (indicated by the white dotted line) is 100 μm.
Figure 2QHE with permanent magnets.
Hall resistance RH (red squares, left vertical axis) and longitudinal resistance Rxx (black circles, right vertical axis) as a function of top gate voltage Vgate measured at 300 mK. The thin dashed lines correspond to the expected values of RH (red) and Rxx (black) for the QHE at filling factors v = ±2.
Figure 3Temperature dependence.
(A) Temperature dependence of RH (red squares, left vertical axis) and Rxx (black circle, right axis) on the ν = +2 plateau at Vgate = −38 V, between 300 mK and 2 K. (B) Plot of ln(Tσxx) vs T−1/2 (circles), where σxx is measured on the ν = +2 plateau, for temperatures between 300 mK and 30 K. The red line is a fit combining variable range hopping and thermally activated transport (see text). Inset: Rxx as a function of Vgate for several temperatures, up to 30 K.