| Literature DB >> 27873844 |
Eui Tae Kim1, Jong-Mo Seo2, Se Joon Woo3, Jing Ai Zhou4, Hum Chung5, Sung June Kim6.
Abstract
Polyimide has been widely applied to neural prosthetic devices, such as the retinal implants, due to its well-known biocompatibility and ability to be micropatterned. However, planar films of polyimide that are typically employed show a limited ability in reducing the distance between electrodes and targeting cell layers, which limits site resolution for effective multi-channel stimulation. In this paper, we report a newly designed device with a pillar structure that more effectively interfaces with the target. Electrode arrays were successfully fabricated and safely implanted inside the rabbit eye in suprachoroidal space. Optical Coherence Tomography (OCT) showed well-preserved pillar structures of the electrode without damage. Bipolar stimulation was applied through paired sites (6:1) and the neural responses were successfully recorded from several regions in the visual cortex. Electrically evoked cortical potential by the pillar electrode array stimulation were compared to visual evoked potential under full-field light stimulation.Entities:
Keywords: Polyimide; electrically evoked cortical potential; optical coherence tomography; pillar; retinal implant
Year: 2008 PMID: 27873844 PMCID: PMC3705534 DOI: 10.3390/s8095845
Source DB: PubMed Journal: Sensors (Basel) ISSN: 1424-8220 Impact factor: 3.576
Figure 1.Schematic illustration of the electrode fabrication. (a) Sacrificial oxide layering (1 μm) by PECVD, lower polyimide (10 μm) by spin coating and Ti/Au/Ti (500 Å/3000 Å /1000 Å) by sputtering; (b) Upper polyimide coating (40 μm); (c) Reactive ion etching (30 μm) for pillar definition; (d) Reactive ion etching (10 μm) for site and pad opening; (e) Ti/Au (300 Å/3000 Å) sputtering as seed layer and photoresist masking to localize the electroplating. (f) electroplating (40 μm); (g) buffered HF etching for final release.
Figure 5.(a) Location of the recording and reference electrodes for the EECP and the VEP measurement in the rabbit. (b) Waveforms of the EECP and the VEP measured by the multi-regional evoked potential recording in twelve spots of the visual cortex, and the isoelectric contour maps of the waveform amplitudes. The EECP and the VEP showed good topographical correlation.
Figure 2.Result of the proposed fabrication process. (a) Electrodes in the stimulation site (top view) and (b) the whole electrode array (side view). (c) Oblique view of pillar electrodes observed with the field emission scanning electron microscope. (d) Diagram of the manufactured pillar electrode.
Figure 3.The result of the cyclic voltammetry of the electrode array. The slew rate was 25mV/s and the voltage sweep was from -0.8V to 1.2V in the first 5 cycles.
Figure 4.Suprachoroidally implanted microelectrode array in the rabbit eye observed four weeks after implantation. (a) Fundus examination showed that choroidal vessels run over the electrode array and the stimulation site was located near the visual streak. (b) The cross-sectional view (lower half) of the optical coherent tomography revealed that overlying retina and choroids were intact without inflammation or swelling. Indented choroidal surface in the en face view (upper half) reflected the pillar structure of the electrodes.