| Literature DB >> 27739683 |
Xuezhi Ma, Yangzhi Zhu, Sanggon Kim, Qiushi Liu, Peter Byrley, Yang Wei1, Jin Zhang1, Kaili Jiang1, Shoushan Fan1, Ruoxue Yan, Ming Liu.
Abstract
Despite many efforts to fabricate high-aspect-ratio atomic force microscopy (HAR-AFM) probes for high-fidelity, high-resolution topographical imaging of three-dimensional (3D) nanostructured surfaces, current HAR probes still suffer from unsatisfactory performance, low wear-resistivity, and extravagant prices. The primary objective of this work is to demonstrate a novel design of a high-resolution (HR) HAR AFM probe, which is fabricated through a reliable, cost-efficient benchtop process to precisely implant a single ultrasharp metallic nanowire on a standard AFM cantilever probe. The force-displacement curve indicated that the HAR-HR probe is robust against buckling and bending up to 150 nN. The probes were tested on polymer trenches, showing a much better image fidelity when compared with standard silicon tips. The lateral resolution, when scanning a rough metal thin film and single-walled carbon nanotubes (SW-CNTs), was found to be better than 8 nm. Finally, stable imaging quality in tapping mode was demonstrated for at least 15 continuous scans indicating high resistance to wear. These results demonstrate a reliable benchtop fabrication technique toward metallic HAR-HR AFM probes with performance parallel or exceeding that of commercial HAR probes, yet at a fraction of their cost.Entities:
Keywords: AFM; deep trench; high aspect ratio; high resolution; silver nanowires
Year: 2016 PMID: 27739683 DOI: 10.1021/acs.nanolett.6b02802
Source DB: PubMed Journal: Nano Lett ISSN: 1530-6984 Impact factor: 11.189