| Literature DB >> 27690190 |
Shuoguo Yuan1, Zhibin Yang1,2, Chao Xie1, Feng Yan1, Jiyan Dai1, Shu Ping Lau1, Helen L W Chan1, Jianhua Hao1,2.
Abstract
A vertical graphene heterostructure field-effect transistor (VGHFET) using an ultrathin ferroelectric film as a tunnel barrier is developed. The heterostructure is capable of providing new degrees of tunability and functionality via coupling between the ferroelectricity and the tunnel current of the VGHFET, which results in a high-performance device. The results pave the way for developing novel atomic-scale 2D heterostructures and devices.Entities:
Keywords: 2D materials; ferroelectric thin films; field-effect transistors; graphene; pulsed laser deposition
Year: 2016 PMID: 27690190 DOI: 10.1002/adma.201601489
Source DB: PubMed Journal: Adv Mater ISSN: 0935-9648 Impact factor: 30.849