| Literature DB >> 27640732 |
Yun Wu1, Xuming Zou2, Menglong Sun1, Zhengyi Cao1, Xinran Wang3, Shuai Huo1, Jianjun Zhou1, Yang Yang1, Xinxin Yu1, Yuechan Kong1, Guanghui Yu4, Lei Liao2, Tangsheng Chen1.
Abstract
Graphene is a promising candidate in analog electronics with projected operation frequency well into the terahertz range. In contrast to the intrinsic cutoff frequency (fT) of 427 GHz, the maximum oscillation frequency (fmax) of graphene device still remains at low level, which severely limits its application in radio frequency amplifiers. Here, we develop a novel transfer method for chemical vapor deposition graphene, which can prevent graphene from organic contamination during the fabrication process of the devices. Using a self-aligned gate deposition process, the graphene transistor with 60 nm gate length exhibits a record high fmax of 106 and 200 GHz before and after de-embedding, respectively. This work defines a unique pathway to large-scale fabrication of high-performance graphene transistors, and holds significant potential for future application of graphene-based devices in ultra high frequency circuits.Entities:
Keywords: field-effect transistors; maximum oscillation frequency; parasitical resistance; radio frequency; self-aligned
Year: 2016 PMID: 27640732 DOI: 10.1021/acsami.6b05791
Source DB: PubMed Journal: ACS Appl Mater Interfaces ISSN: 1944-8244 Impact factor: 9.229