Highly Sensitive Formation of Stable Surface Relief Structures in Bisanthracene Films with Spatially Patterned Photopolymerization.

A facile method for the fabrication of a highly sensitive surface relief is demonstrated, which operates on the principle of spatially patterned photopolymerization-induced mass transport in the amorphous films of a series of bisanthracene compounds. The stability of the resultant colorless transparent relief structure is dramatically improved owing to the polymerization of the bisanthracene.