Literature DB >> 27483462

Investigation of hexagonal boron nitride as an atomically thin corrosion passivation coating in aqueous solution.

Jing Zhang1, Yingchao Yang, Jun Lou.   

Abstract

Hexagonal boron nitride (h-BN) atomic layers were utilized as a passivation coating in this study. A large-area continuous h-BN thin film was grown on nickel foil using a chemical vapor deposition method and then transferred onto sputtered copper as a corrosion passivation coating. The corrosion passivation performance in a Na2SO4 solution of bare and coated copper was investigated by electrochemical methods including cyclic voltammetry (CV), Tafel polarization and electrochemical impedance spectroscopy (EIS). CV and Tafel analysis indicate that the h-BN coating could effectively suppress the anodic dissolution of copper. The EIS fitting result suggests that defects are the dominant leakage source on h-BN films, and improved anti-corrosion performances could be achieved by further passivating these defects.

Entities:  

Year:  2016        PMID: 27483462     DOI: 10.1088/0957-4484/27/36/364004

Source DB:  PubMed          Journal:  Nanotechnology        ISSN: 0957-4484            Impact factor:   3.874


  4 in total

1.  Acetylene chain reaction on hydrogenated boron nitride monolayers: a density functional theory study.

Authors:  R Ponce-Pérez; Gregorio H Cocoletzi; Noboru Takeuchi
Journal:  J Mol Model       Date:  2017-11-28       Impact factor: 1.810

2.  Corrosion resistance of monolayer hexagonal boron nitride on copper.

Authors:  F Mahvash; S Eissa; T Bordjiba; A C Tavares; T Szkopek; M Siaj
Journal:  Sci Rep       Date:  2017-02-13       Impact factor: 4.379

Review 3.  Recent Advances in Barrier Layer of Cu Interconnects.

Authors:  Zhi Li; Ye Tian; Chao Teng; Hai Cao
Journal:  Materials (Basel)       Date:  2020-11-09       Impact factor: 3.623

Review 4.  Continuous orientated growth of scaled single-crystal 2D monolayer films.

Authors:  Ziyi Han; Lin Li; Fei Jiao; Gui Yu; Zhongming Wei; Dechao Geng; Wenping Hu
Journal:  Nanoscale Adv       Date:  2021-10-29
  4 in total

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