| Literature DB >> 27345474 |
Y C Guan1,2, Y W Fang2, G C Lim2, H Y Zheng2, M H Hong3.
Abstract
Porous structure of reduced graphene oxide (rGO) plays an important role in developing flexible graphene-based devices. In this work, we report a novel methodology for reduction of freestanding graphite oxide (GO) sheet by picosecond pulse laser direct writing in liquid nitrogen. Non-agglomerate and porous structure of rGO is fabricated successfully due to frozen effect during laser processing. Compared with laser-irradiated rGO developed in N2 gas at ambient environment, the frozen rGO developed in liquid N2 shows better ordered structure with less defects, crack-free morphology as well as better electron supercapacitor performance including 50-60 Ω/sq in sheet electrical resistance. Mechanism of cryotemperature photoreduction GO is also discussed.Entities:
Year: 2016 PMID: 27345474 PMCID: PMC4922015 DOI: 10.1038/srep28913
Source DB: PubMed Journal: Sci Rep ISSN: 2045-2322 Impact factor: 4.379
Typical techniques for reduction of GO and their properties.
| Chemical reaction | mixture acids | C/O:5.28 ID/IG:1.32 | 1251 S/m | |
| modified GO | ID/IG:1.36 | 1660 S/m | ||
| Thermal treatment | mixture GO dispersion | C/O: 6.59 ID/IG:1.35 | 5746 Ω/sq | 7 |
| polycarbonate matrix | C/O:6.0 | 410 S/m | ||
| Photo-chemical reaction | UV lamp of GO suspension | C-OH, C = O, O = C-OH (%): 76%, 85% and 81% decrease | 4.6 × 106 Ω/sq | |
| Hg lamp of GO sheet and chemical suspension | ID/IG:0.08 (single layer) | 7.1 × 104 Ω/sq | ||
| Laser reduction | Excimer laser for GO solution | C/O: 40 | 100–500 Ω/sq | |
| Diode laser for GO sheet | C–C (%): 69.2 | 3830 S/m |
Figure 1Raman spectra of as-received GO sheet and the generated rGO after laser irradiation in N2 gas/liquid N2.
Parameters of GO and rGO derived from D, G, and 2D in Raman spectra.
| GO | 1350 ± 2 | 180 ± 2 | 1585 ± 2 | 93 ± 1 | 0.82 | – | – |
| rGO N2 gas | 1364 ± 2 | 54 ± 1 | 1585 ± 1 | 42 ± 1 | 0.43 | 2718 ± 1 | 72 ± 1 |
| rGO Liquid N2 | 1355 ± 2 | 46 ± 1 | 1578 ± 1 | 34 ± 1 | 0.27 | 2708 ± 1 | 67 ± 1 |
Figure 2Microstrutrue features of rGO by laser direct writing.
(a) SEM of laser induced rGO in N2 gas; (b) High magnification of (a); (c) EDS line scan of (a); (d) SEM of laser induced rGO in liquid N2; (e) High magnification of (d); (f) EDS line scan of (b).
Figure 3AFM 2D/3D analyses.
(a) surface topography of rGO in N2 gas (b) surface topography of rGO in liquid N2.
Chemical compositions of GO and rGO derived from C 1 s spectra in XPS spectra (at.%).
| GO | 38.5 | 26.7 | 6.9 |
| rGO in N2 gas | 67.4 | 19.5 | 5.1 |
| rGO in liquid N2 | 75.3 | 12.3 | 3.6 |
Figure 4Electrochemical performance of rGO in both N2 gas and liquid N2.
(a) CV profiles of rGO in N2 gas at different scan rates of 40, 60, 80, and 100 mV/s; (b) Galvanostatic charge/discharge curves of rGO in N2 gas at different current density of 1, 2, 4, 6 A/g; (c) CV profiles of rGO in liquid N2 at different scan rates of 40, 60, 80, and 100 mV/s; (d) Galvanostatic charge/discharge curves of rGO in liquid N2 at different current density of 1, 2, 4, 6 A/g.
Figure 5Schematic setup of direct laser writing for the reduction of GO.