Electrical contacts on the top surface of solar cells and light emitting diodes cause shadow losses. The phenomenon of extraordinary optical transmission through arrays of subwavelength holes suggests the possibility of engineering such contacts to reduce the shadow using plasmonics, but resonance effects occur only at specific wavelengths. Here we describe instead a broadband effect of enhanced light transmission through arrays of subwavelength metallic wires, due to the fact that, in the absence of resonances, metal wires asymptotically tend to invisibility in the small size limit regardless of the fraction of the device area taken up by the contacts. The effect occurs for wires more than an order of magnitude thicker than the transparency limit for metal thin films. Finite difference in time domain calculations predict that it is possible to have high cloaking efficiencies in a broadband wavelength range, and we experimentally demonstrate contact shadow losses less than half of the geometric shadow.
Electrical contacts on the top surface of solar cells and light emitting diodes cause shadow losses. The phenomenon of extraordinary optical transmission through arrays of subwavelength holes suggests the possibility of engineering such contacts to reduce the shadow using plasmonics, but resonance effects occur only at specific wavelengths. Here we describe instead a broadband effect of enhanced light transmission through arrays of subwavelength metallic wires, due to the fact that, in the absence of resonances, metal wires asymptotically tend to invisibility in the small size limit regardless of the fraction of the device area taken up by the contacts. The effect occurs for wires more than an order of magnitude thicker than the transparency limit for metal thin films. Finite difference in time domain calculations predict that it is possible to have high cloaking efficiencies in a broadband wavelength range, and we experimentally demonstrate contact shadow losses less than half of the geometric shadow.
The contacts in optoelectronic devices have two competing requirements: low electrical
resistivity, and high light transmittance. To date, this trade-off has limited the
performance of optoelectronic devices such as solar cells and light emitting diodes
(LEDs). The first proposals to direct light away from the top contacts appeared not long
after the birth of photovoltaics, but these schemes based on ray tracing optics (such as
microlenses) suffer from added complexity, and fail to work when there are features not
much larger than the light wavelength12. Recent advances in nanowire
technology have improved the contact characteristics of low power density devices34, but still result in shadow losses that are unacceptable for
concentrator solar cells and other high power density devices such as LEDs. For devices
operating at specific wavelengths (which is not the case for solar cells), this
difficulty can perhaps be overcome by engineering plasmonic resonant effects56. Transparent conductive oxides such as indium tin oxide (ITO) offer
sufficient performance (90% transmission with an 11 Ω/sq sheet
resistance) for devices operating at low current densities, such as flat panel displays
and organic LEDs7. The scarcity of Indium has motivated research into
alternatives such as the organic polymer PEDOT:PSS, with 91% transmission and
226 Ω/sq sheet resistance8. Van de Groep et
al. have demonstrated silver nanowire network arrays on glass with 89%
transmission and 20 Ω/sq sheet resistance9, and
the group of Prof. Cui has perfected metal nanowire fabrication from electrospun fibres,
reaching 90% transmittance and 2 Ω/sq sheet resistance4. State of the art multijunction solar cells require noble metal top
contact grids with >95% transmittance and <10 Ω/sq
sheet resistance to operate at high sunlight concentrations (>500 suns)1011. Here we demonstrate nanowire arrays with a sheet resistance of
2.5 Ω/sq at 96.4% transmission (with a long period array), and
0.31 Ω/sq at 91% transmission (with a short period array). We
show that optimized metal nanowires cast an effective shadow much smaller than the
geometric shadow, and consequently, optoelectronic devices can be designed in a way that
significantly reduces the losses due to the top contact, overcoming the previously
mentioned trade-off. The effect is applicable to a wide range of technical problems,
such as contacts in solar cells, light emitting diodes (LEDs) and flat panel displays,
but here we focus our attention on concentrator photovoltaics (CPV), perhaps the most
demanding of these due to the need to minimize losses across a broadband wavelength
range.Recent interest in plasmonic solar cells has primarily been focused on increasing the
optical path length or near field intensity in optically thin solar cells by adding
components such as nanoparticles or diffraction gratings121314.
Instead, we focus on nanostructuring an already existing and necessary component, the
front contact, to reduce shadow losses12.The questions addressed in this work are best understood on the basis of the analytical
solution for the interaction of the electromagnetic field with a freestanding metal
cylinder1516. In the small size limit (when the ratio of the wire
circumference to the wavelength is x ≪ 1),
under normal incidence, and away from resonance, the scattering amplitudes for light
polarized parallel to the wire T and transversal to the wire
T can be approximated to15:where θ is the scattering angle,
n = n/n
is the relative refractive index, n is the refractive index of
the wire, n is the refractive index of the incidence medium,
x = πwn/λ
is the size parameter, w is the wire diameter, and λ is the
free space wavelength. Of interest here are the absorption and scattering efficiencies
defined as the absorption and scattering cross sections divided by the wire area
projected onto a plane perpendicular to the incident beam (geometric shadow). The
optical theorem states that the total extinction (absorption+scattering) efficiency is
directly given by the forward scattering amplitude as 17. The scattering efficiencies in the small size limit are15:Therefore Q scales with size as
x while Q scales as x, implying that the
extinction is dominated by absorption in the small size limit. As
x → 0, both the extinction efficiency and the
wire geometric area tend to zero as x, while the extinction cross section tends
to zero as x. Therefore in the small size limit, and in
the absence of resonances, metal nanowires become invisible, a fact that can be used to
advantage in the design of top contact grids for solar cells and LEDs. At resonant
wavelengths the Rayleigh approximation is of little use, as the series expansion of the
scattering amplitudes in terms of powers of x cannot be truncated at the leading
terms, except for extremely small values of x, and the resulting trend as a
function of x is completely different from that given by Rayleigh. Neglecting
dissipative losses, the extinction efficiency due to a localized surface plasmon
resonance in a free standing cylinder under normal incidence illumination is always
Q = 4/x at the resonant
wavelegth.16 This is in clear contrast with Rayleigh scattering, for
which case Q is proportional to x. The opposing trends of resonant and
non-resonant contributions to extinction, will be discussed again below, in the
interpretation of our results.To study light scattering and absorption in geometries relevant to state of the art solar
cells, we have used finite difference time domain calculations (FDTD). We have
calculated the effective shadow factor as
S = (J−J)/J,
where J and J are the fluxes entering the active part
of the semiconductor with and without the metal nanowires, respectively. The shadow
efficiency is S/G where G is the fraction of the device area
covered by the contacts (geometric shadow factor) and the cloaking efficiency is given
by 1−S/G. The shadow efficiency as a function of wire width
for a realistic device geometry (Fig. 1a) and unpolarized light is
shown in Fig. 1b. The horizontal stripes are diffraction effects
with little impact in the total generated photocurrent. Localized surface plasmon
resonances can be recognized in Fig. 1b as oblique bands with
increased shadow losses at nearly constant size parameter
(x = πwn/λ).
These are most easily recognizable at wavelengths from 800 to 1000 nm. For
wire widths around 400 nm, the shadow is well below the geometric limit,
with cloaking efficiencies above 50% for most wavelengths.
Figure 1
Shadow efficiency for silver wires on a GaAs solar cell.
(a) Structure used to calculate the optical losses caused by the top
metal contact. (b) The fraction of the incoming power lost due to
reflection and absorption at the metal contact is plotted normalized to the
fraction of the area taken up by the contact as a function of wavelength and
wire width. The wire height and period are fixed at 600 nm and
10 μm, respectively. Normal incidence illumination
with unpolarized light. (c) Spectrally integrated shadow efficiency
as a function of wire width. The data are weighted with the direct+
circumsolar AM1.5 solar spectrum18. The red and blue lines
represent, respectively, the absorption and reflection contributions to the
total shadow (thick grey line). The dashed line is a fit to an
ax + b/x expression with only two free
parameters were the two terms can be identified with non-resonant Rayleigh
extinction and resonant extinction, respectively.
Underlying the complex patterns in Fig. 1b due to the combined
effects of diffraction, non-resonant extinction, and localized surface plasmon
resonances, there is a simple trend that is revealed by integrating across wavelengths.
We have weighted the data in Fig. 1b with the direct solar
spectrum18 to find the width that should yield the highest sunlight
transmission. The resulting spectrally weighted shadow efficiencies as a function of
wire width are shown in Fig. 1c. The fact that the shape of the
weighted shadow efficiency curve can be fitted to
ax + b/x using only two adjustable parameters is not
coincidental, and still holds for systems with different composition and geometry (see
supplementary information). The Purcell
sum rule, closely related to the Thomas-Reiche-Kuhn sum rule, determines that if the
integration interval is extended to infinite wavelength, the resulting spectrally
integrated extinction efficiency is given by a single term directly proportional to the
wire diameter1519. In the present case of a finite integration range
weighted by the solar spectrum, the minimum in the integrated shadow efficiency curve of
Fig. 1c is due to the crossover between resonant extinction
(proportional to 1/x) predominating at short wavelengths, and non-resonant
Rayleigh scattering (proportional to x) predominating at long wavelengths. The
integrated shadow efficiency deviates from the Rayleigh approximation for wires wider
than 500 nm, and asymptotically tends to the ray-tracing limit.To experimentally demonstrate the described cloaking effect, we have fabricated GaAs
solar cells with near optimal contact wire widths. The fabricated devices and the
corresponding experimental results and simulations are shown in Fig.
2. At long wavelengths, cloaking efficiencies higher than 60% have been
obtained for silver nanowire arrays (Fig. 2b). The high absorption
at short wavelengths that gives gold its characteristic yellow colour causes much higher
losses than in the case of silver (compare Fig. 2b,e), but the
cloaking effect still occurs at long wavelengths. The difference in period has little
effect on the cloaking efficiency, but is the result of two different fabrication
processes that were developed in parallel (see Methods and Suppl. Info.). The main
differences between our simulations and experiments occur in the case of silver wires at
long wavelengths for parallel polarization (Fig. 2c,f). Reflection
is the only relevant optical loss mechanism for a perfect ideal nanowire illuminated
with parallel polarised light. (see Figs S1
and S23 in the supplementary material and
ref. 16). The main difference between the simulated
idealisation and our experimental nanowires is surface roughness. Accurately simulating
the effects of surface roughness on the optical properties of metal nanowires would have
a very high computational cost, but the effects of roughness can be inferred by
comparing the experimental results from rough nano-structures with results from perfect
nano-structures without roughness. The optical properties of metal nanowires with
various kinds of imperfections such as surface roughness and polycrystalline grain
boundaries have been reported by various independent groups to depart from the results
expected from ideal, perfect nanowires202122. Most importantly,
surface roughness results in the coupling of localised and propagating surface plasmons
with radiation polarised along the wire axis, an effect that does not exist for ideal
wires lacking structure along the longitudinal direction. Light incident on the wire
that would otherwise be reflected is instead coupled to the wire due to surface
roughness. It has been shown that most of the parallel polarized light coupled to
nanowires on high index substrates such as GaAs is re-emitted towards the substrate,
increasing transmission23. Billaudeau et al. have also shown that
periodic perturbations along the propagation path of surface plasmons result in
increased transmission to the GaAs substrate24. Furthermore, these
authors have shown that the minima in the propagation length of surface plasmons
coincide with the transmission maxima due to radiative re-emission into the GaAs
substrate. This indicates that most of the parallel polarized light that couples to
propagating surface plasmons is re-emitted into the GaAs substrate, rather than absorbed
by the metal or re-emitted to free space. Therefore, for parallel polarized light, the
experimental shadowing efficiencies of real nanowires with surface roughness can be
expected to be lower than that of ideal nanowires due to decreased reflection and
increased scattering into the substrate of light coupled to surface plasmons. The effect
of roughness is more pronounced in our silver wires than in our gold wires because the
top side of the later was flattened by an argon ion milling step that was not used in
our silver wires.
Figure 2
Comparison of experimental and simulated results for silver and gold wire
arrays.
(a) Scanning electron microscopy image of silver wires
electrodeposited through a SiOx mask on a GaAs solar cell. The
length of the scale bar is half the 4 μm array
period. (b) Experimentally measured shadow efficiencies for the
silver wires in Fig. 2a. Results for transversal polarization, parallel
polarization, and unpolarized light are shown in orange, blue, and black,
respectively. (c) FDTD simulations corresponding to the experimental
results for silver wires in Fig. 2b. (d) Scanning electron microscopy
image of gold wires electrodeposited through a SiOx mask on a
GaAs solar cell. The length of the scale bar is twice the
16.7 μm array period. (e) Experimentally
measured shadow efficiencies for gold wires. (f) FDTD simulations
corresponding to the experimental results for gold wires.
The silver wire arrays with a period of 4 μm presented in Fig. 2 have a wavelength integrated transmission of 91%, and a
measured grid sheet resistance of 0.31 Ω/sq, while the gold wire
arrays with 16.7 μm period have a wavelength integrated
transmission of 96.4%, with a measured grid sheet resistance of
2.5 Ω/sq. Both results compare favourably with the state of the
art4.To assess the technological relevance of the effect here described it is necessary to
consider both electrical and optical energy loss mechanisms. In Fig.
3 we present calculations of the total power loss including resistance losses
as a function of wire width following the work of Moore25, without
inclusion of optical cloaking effects. Calculation parameters correspond to a typical
concentrator solar cell: emitter sheet resistance of 300 Ω/sq,
500 suns concentration, 1 mm2 active area. Fortunately, wire
widths of the order of 500 nm are optimal not only from the point of view of
maximum optical cloaking efficiency (Fig. 1c), but also from the
point of view of minimum series resistance losses (Fig. 3), as
well as being above the threshold for problematic effects such as electro-migration26, and increased resistivity due to the wire dimensions approaching the
electron mean free path length27. The minimum in Fig.
3 is due to the cross over between geometries dominated by spreading
resistance losses (at large wire spacings), geometries dominated by grid resistance
losses (at small wire widths and large wire spacings), and geometries dominated by
shadow losses (at large wire widths and small wire spacings)25. Contact
lines in concentrator solar cells typically have wire spacings of the order of
100 μm, but still suboptimal wire widths of the order of a few
μm due to a number of technological difficulties that we have made progress
in overcoming (see methods section). The devices that we have fabricated for the purpose
of experimentally demonstrating contact cloaking have purposely small wire spacings as
otherwise shadow losses would become too small to measure accurately. As the wire
spacing is increased, the grid sheet resistance will increase linearly with the spacing,
while the shadow losses (the main loss mechanism in our devices) will decrease inversely
with the spacing. The spectrally integrated cloaking effect shown in Fig.
1c is independent of wire spacing (see supplementary material), except for very small spacings of the order of the
light wavelength, where reduced reflection can be expected due to diffraction
suppresion282930.
Figure 3
Calculated power loss caused by the top contact.
The plot represents the ratio of the power loss to the device power output.
Lighter to darker shades of blue correspond respectively to array periods of
20, 40, 60, 80, 100, 120 and 140 μm.
Using nanofabrication techniques, and with proper optimization, there is ample room to
reduce the losses caused by the top contact. In applications making use of a very wide
range of wavelengths (such as multijunction solar cells), maximum transmission
efficiency is achieved with wire dimensions corresponding to the transition between
extinction dominated by resonances and extinction dominated by non-resonant Rayleigh
scattering. These results should lead to significant improvements over current designs
for concentrator solar cells, light emitting diodes, and flat panel displays.
Methods
FDTD simulations were performed using Lumerical FDTD Solutions software. The typical
line width, height and geometric shadow factor used in concentrator solar cells are
3 μm, 600 nm and 3% respectively10. Using this standard design as a starting point, we have explored designs with
periods and wire widths an order of magnitude smaller but similar geometrical shadow
factors while leaving the grid resistance almost unchanged. The FDTD simulation cell
has been designed in the following way:-The above and below boundaries conditions are set as 12 Perfect Matching Layers
(PML) so that all the energy escaping the cell is absorbed without spurious
reflections. The cell height has been kept constant at 8 μm
for all the simulations, with boundaries 6 μm above the
GaAs/air (or AlInP) interface and 2 μm into the GaAs.-Left and right boundaries are changed depending on the simulation type. When a grid
is studied, Periodic Boundary Conditions are used, and when studying an isolated
wire 12 PML are used. Isolated wires are studied in a 30 μm
wide cell in order to collect light scattered at shallow angles (this is the cause
for the observed diffraction effects in the isolated wire shadow efficiency map).
For the rest of simulations cell width is changed accordingly with the fixed shadow
factor or period requirements.-For Solar Cell structure simulations, layers are stacked over the GaAs as follows
from bottom to top: 20 nm AlInP, 30 nm ZnS,
45 nm Si3N4. The structure under the metal lines
is, from bottom to top 20 nm AlInP, 80 nm contact GaAs layer
and the metal (typically 600 nm height). The semi-elliptical shape was
chosen due to the results of preliminary tests showing higher cloaking efficiencies
than for rectangular cross sections. The incident medium is SiO2.-Materials refraction indexes are taken from the Lumerical materials library
corresponding to Palik when possible (GaAs, Ag, SiO2, ZnS) and from other
databases when not (AlInP:SOPRA, Si3N4: T.Baak, Au: Johnson
and Christy) and are fitted to a single polynomial for the whole spectrum of the
source.-The light source is a plane wave spanning wavelengths from 350 nm to
1600 nm normally incident on the structure from
5 μm over the GaAs interface. Each polarization is simulated
separately.-Charge carrier transport effects are expected to play a very minor role as the
changes in the photogeneration profile as a function of depth are small in all
studied cases, resulting in negligible changes in the internal quantum
efficiency.-In order to make comparable power transmission measurements between the reference
and metal line simulations, meshing has been forced to a 4 nm size in
the ARC and metal line area. The 4 nm meshing was chosen after
convergence testing.-In the same fashion the transmission power monitors have been set to a
4 nm height over the GaAs into the AlInP, as some of the carriers
generated in the window layer can be collected and contribute to the
photocurrent.-The reflection power monitor is located 500 nm over the source to avoid
source influence.-To calculate the absorption we assume that the sum of reflection, absorption and
transmission equals the incident power. This is only approximately true in the
calculations using PMLs at the lateral boundaries, and thus absorption could not be
calculated reliably in this case.Diffraction features are barely noticeable in large period arrays, but in the case of
short period arrays the diffraction features obscure other spectral features of
interest (Rayleigh extinction and localized plasmon resonances). Fortunately these
diffraction features in the spectra are very sensitive to the light incidence angle.
Because the experiments are done with focused light using a lens with 0.4 numerical
aperture, light incidence angles range from 0° to 23°
relative to the surface normal, blurring all diffraction features. Simulated spectra
for short period arrays have thus also been averaged for incidence angles in the
same range as in the experiment. In these simulations the reflection monitor had to
be positioned above the light source to avoid artefacts related to the light
injection method, and phase preserving periodic boundary conditions had to be used
(Bloch periodic boundary conditions).All solar cells were fabricated on GaAs n-type substrates by solid source
molecular beam epitaxy (MBE). The fabrication procedure is summarized in Fig. 4. Devices were processed using a combination of UV
lithography techniques, plasma etching and a double step metallization. The first
step (Fig. 4a) involves plasma enhanced chemical vapor
deposition (PECVD) to deposit a thick sacrificial layer of SiOx
(400–600 nm) to both protect the semiconductor and to serve
as a mold for the electrodeposition. A 160 nm thick layer of iCON-16
organic bottom antireflective coating (BARC) was deposited by spin coating and
prebaked at 90 °C for 90 s. This layer had three functions:
to planarize the surface prior to resist coating; to lead to a better resolution by
preventing reflection and standing waves in the photoresist; and to serve as a
lift-off layer after the contact seed layer deposition. On top of the BARC, a
500 nm thick layer of photoresist was spun-on (Fig.
4b). For the short period Ag arrays, patterns were defined by laser
interference lithography (LIL) on NR9-500PY negative photoresist after prebaking at
120 °C for 120s, whereas for the long period Au arrays
contact mask lithography on S1805 positive photoresist was used after prebaking at
115 °C for 60 s. For LIL patterning, a
Lloyd’s mirror interferometric lithography system was used31 with a 355-nm third harmonic YAG laser source; the power density was
adjusted so that a dose of ~30 mJ/cm2 was
delivered in about 4000 pulses at 80 Hz. After a post-exposure bake, the
patterns were developed in a KOH based developer. The resulting patterns consisted
of 400–600 nm wide lines over large areas
(>1 cm2). For long period Au arrays,
photoresist development was followed by Cr deposition as a mask for dry etching and
photoresist lift off (Fig. 4f), whereas for short period Ag
arrays, the photoresist was directly used as a dry etching mask. Reactive ion
etching (RIE) in a Oxford Plasmalab 80 by means of a CHF3 plasma was then
performed to transfer the line pattern to the device surface through the iCON-16 and
photoresist/SiOx layers. For the Ag short period arrays, details of
this plasma etching process include: chamber pressure, 19 mTorr; RIE power, 100 W;
wafer temperature, 30 °C; output DC Bias,
~275 V. This etch was stopped with a thin layer
(20 nm) of SiOx at the bottom of the trench to protect the
GaAs. In the gold wire arrays, verticality of the side walls was improved by using a
pulsed etch with an on/off cycle of 30 s/120 s, with N2 flow in the first
off minute, as well as using a lower pressure (5 mTorr), higher power plasma (200 W,
475V). A quick dilute HF dip was used to remove the remaining SiOx at the
bottom of the trenches and the bus bars. For the Au wires, an ohmic contact was
formed by deposition of a thin layer of metal that also served as a seed layer for
the electrodeposition (Fig. 4i). The metallization was
thermally evaporated Cr/Au (10/60 nm). Silver wires did not require a
seed layer. A lift-off of the iCON-16 BARC layer and the metal overlayer was then
performed (Fig. 4j). Next, the lines were thickened by a
potentiostat controlled electrodeposition step. A cyanide-free gold
sulphite/thiosulphate based solution was used without additives. Gold was
electrodeposited at a constant potential of −0.3 V vs.
Ag/AgCl for 40–60 s using a 0,03 M NaAuCl4
aqueous solution kept at 60 °C with 220 rpm
agitation. To ensure complete filling we let the lines overflow the trench and then
removed the excess material by Ar ion-milling (reactive ion beam etching with a
450 V plasma) at a incidence angle of 65° away from the
surface normal (Fig. 4k). Silver was electrodeposited at a
constant current density of 0.8 mA/cm2 from a
100 ml water based solution with 0.4 g
AgK(CN)2 + 7 g
KCN + 2.5 g K2CO3. There
was no need to remove excess silver as this process allowed for a precise stopping
of the electrodeposition after trench filling. In some of the samples, the
SiOx layer was etched in diluted HF for SEM inspection, but all
samples were inmersed in mineral oil index matched to SiOx for optical
characterization. For device separation, mesas were defined by means of
photolithography and wet etching of the GaAs with H3PO4. I-V
curves were measured in the dark to characterize the electrical performance. For
photocurrent measurements, samples were immersed in high purity mineral oil
(tetradecane) to protect silver from tarnishing, as well as to emulate the
refractive index of a concentrator secondary stage. To minimize the possible effect
of a higher series resistance in the reference experiments, the photocurrent
measurements were done at low photon fluxes (of the order of 1 nW). The
AC photocurrent generated by light modulated at 477 Hz was collected
through 20 μm diameter Tungsten probes and demodulated using
a lock-in amplifier. The light from a halogen lamp was dispersed by a
0.3 m focal length monochromator set to a spectral resolution of
~1 nm and then coupled into a 200 micron core size multimode
optical fibre. Light coming from the fibre was recollimated and linearly polarized
parallel or perpendicular to the grid direction using a fixed Glan-Thompson
polarizer and an achromatic half wave retarder. The polarized beam was then focused
onto the device within a 30 μm diameter spot using a low
magnification objective lens (NA = 0.4). A filter was
required to exclude high energy photons due to higher diffraction orders in
measurements across the 550 nm to 850 nm spectral range.
Figure 4
Metal nanowire array fabrication sequence.
(a) SiOx deposition by CVD. (b) Organic antireflective coating
and photoresist spin coating. (c) Photoresist exposure by laser
interference lithography. (d) Photoresist development. (e) Cr
deposition. (f) Lift off. (g) Reactive ion etching. (h)
Seed contact metal deposition by sputtering. (i) Organic
antireflective coating lift off. (j) Electrodeposition. (k)
Grazing angle Ar ion milling. (l) Finished contact array.
The experimental shadow efficiencies are obtained as
S = (I−I)/I,
where I and I are the currents measured in areas
with and without nanowires within the same device under very low intensity
illumination (1 nW) and an illumination spot focused to a diameter of
30 μm. The reported transmission values are obtained by
integrating 1−S in wavelength. The illumination spot was scanned
over the sample to ensure that the devices were homogenous and local features did
not affect the spectra. Spectra were recorded for the two linear polarizations
changing only the retarder angle. The grid sheet resistance was measured by the four
point probe method with a high precision current source and a separate
nanovoltmeter.
Additional Information
How to cite this article: San Román, E. et al. Cloaking of
solar cell contacts at the onset of Rayleigh scattering. Sci. Rep. 6,
28669; doi: 10.1038/srep28669 (2016).
Authors: Zhong-Jian Yang; Tomasz J Antosiewicz; Ruggero Verre; F Javier García de Abajo; S Peter Apell; Mikael Käll Journal: Nano Lett Date: 2015-10-29 Impact factor: 11.189
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