| Literature DB >> 27302281 |
Xinyi Li1, Huaqiang Wu, Wei Wu, Dong Wu, Ning Deng, Jian Cai, He Qian.
Abstract
In RRAM devices, electrodes play a significant role during the switching process. In this paper, different top electrodes are used for TaO y /Ta2O5-x /AlO σ triple-oxide-layer devices. Top electrode-induced digital resistive switching to analog resistive switching was observed. For Pt top electrode (TE) devices, abrupt digital resistive switching behavior was observed, while Al TE devices showed gradual analog resistive switching behavior. Devices with various AlO σ thicknesses and sizes were fabricated and characterized to evaluate the reliability of the analog resistive switching. The physical mechanisms responsible for this electrode-induced resistive switching behavior were discussed.Year: 2016 PMID: 27302281 DOI: 10.1088/0957-4484/27/30/305201
Source DB: PubMed Journal: Nanotechnology ISSN: 0957-4484 Impact factor: 3.874