| Literature DB >> 27250385 |
A Sokolov1, P Bischoff1, F Eggenstein1, A Erko1, A Gaupp1, S Künstner1, M Mast1, J-S Schmidt1, F Senf1, F Siewert1, Th Zeschke1, F Schäfers1.
Abstract
A new Optics Beamline coupled to a versatile UHV reflectometer is successfully operating at BESSY-II. It is used to carry out at-wavelength characterization and calibration of in-house produced gratings and novel nano-optical devices as well as mirrors and multilayer systems in the UV and XUV spectral region. This paper presents most recent commissioning data of the beamline and shows their correlation with initial beamline design calculations. Special attention is paid to beamline key parameters which determine the quality of the measurements such as high-order suppression and stray light behavior. The facility is open to user operation.Year: 2016 PMID： 27250385 DOI： 10.1063/1.4950731
Source DB: PubMed Journal: Rev Sci Instrum ISSN： 0034-6748 Impact factor: 1.523