Literature DB >> 27237137

Effect of Zr Content on the Wake-Up Effect in Hf1-xZrxO2 Films.

Min Hyuk Park1,2, Han Joon Kim1, Yu Jin Kim1, Young Hwan Lee1, Taehwan Moon1, Keum Do Kim1, Seung Dam Hyun1, Franz Fengler2, Uwe Schroeder2, Cheol Seong Hwang1.   

Abstract

In this study, the changes in the structural and electrical properties of ferroelectric Hf1-xZrxO2 films with various Zr contents (0.26-0.70) were systematically examined during electric field cycling, resulting in a "wake-up" effect. To quantify the degree of wake-up effect, a "variable" polarization as the difference between remanent and saturation polarization was suggested as a new parameter, which could be calculated by excluding the linear dielectric contribution from the total electric displacement. Here, the variable polarization value could be minimized for an optimized Zr content of 0.43, which was slightly lower than the value for the largest remanent polarization. The polymorphism in Hf1-xZrxO2 thin films is known to be complicated due to the relatively small energy differences between various phases, such as the monoclinic, tetragonal, and orthorhombic phases. The variations in the polarization-electric field characteristics and dielectric constant values could be qualitatively and quantitatively understood based on the competition of various polymorphs that are dependent on the Zr content. Furthermore, a schematic model for the spatial distribution of mixed phases was suggested for Hf1-xZrxO2 films with various Zr contents based on the experimental observations.

Entities:  

Keywords:  endurance; ferroelectrics; hafnium oxide; nonvolatile memory; wake-up

Year:  2016        PMID: 27237137     DOI: 10.1021/acsami.6b03586

Source DB:  PubMed          Journal:  ACS Appl Mater Interfaces        ISSN: 1944-8244            Impact factor:   9.229


  3 in total

1.  Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO2 Ferroelectric Capacitor.

Authors:  Yejoo Choi; Changwoo Han; Jaemin Shin; Seungjun Moon; Jinhong Min; Hyeonjung Park; Deokjoon Eom; Jehoon Lee; Changhwan Shin
Journal:  Sensors (Basel)       Date:  2022-05-27       Impact factor: 3.847

2.  A Comparative Study on the Ferroelectric Performances in Atomic Layer Deposited Hf0.5Zr0.5O2 Thin Films Using Tetrakis(ethylmethylamino) and Tetrakis(dimethylamino) Precursors.

Authors:  Baek Su Kim; Seung Dam Hyun; Taehwan Moon; Keum Do Kim; Young Hwan Lee; Hyeon Woo Park; Yong Bin Lee; Jangho Roh; Beom Yong Kim; Ho Hyun Kim; Min Hyuk Park; Cheol Seong Hwang
Journal:  Nanoscale Res Lett       Date:  2020-04-07       Impact factor: 4.703

3.  Reversible transition between the polar and antipolar phases and its implications for wake-up and fatigue in HfO2-based ferroelectric thin film.

Authors:  Yan Cheng; Zhaomeng Gao; Kun Hee Ye; Hyeon Woo Park; Yonghui Zheng; Yunzhe Zheng; Jianfeng Gao; Min Hyuk Park; Jung-Hae Choi; Kan-Hao Xue; Cheol Seong Hwang; Hangbing Lyu
Journal:  Nat Commun       Date:  2022-02-03       Impact factor: 14.919

  3 in total

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