Literature DB >> 27231754

Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers.

Yu Jin Kim1, Hiroyuki Yamada2, Taehwan Moon1, Young Jae Kwon1, Cheol Hyun An1, Han Joon Kim1, Keum Do Kim1, Young Hwan Lee1, Seung Dam Hyun1, Min Hyuk Park1, Cheol Seong Hwang1.   

Abstract

The negative capacitance (NC) effects in ferroelectric materials have emerged as the possible solution to low-power transistor devices and high-charge-density capacitors. Although the steep switching characteristic (subthreshold swing < sub-60 mV/dec) has been demonstrated in various devices combining the conventional transistors with ferroelectric gates, the actual applications of the NC effects are still some way off owing to the inherent hysteresis problem. This work reinterpreted the hysteretic properties of the NC effects within the time domain and demonstrated that capacitance (charge) boosting could be achieved without the hysteresis from the Al2O3/BaTiO3 bilayer capacitors through short-pulse charging. This work revealed that the hysteresis phenomenon in NC devices originated from the dielectric leakage of the dielectric layer. The suppression of charge injection via the dielectric leakage, which usually takes time, inhibits complete ferroelectric polarization switching during a short pulse time. It was demonstrated that a nonhysteretic NC effect can be achieved only within certain limited time and voltage ranges, but that these are sufficient for critical device applications.

Entities:  

Keywords:  Negative capacitance; charge injection; depolarization field; ferroelectrics thin films; hysteresis; low-power devices

Year:  2016        PMID: 27231754     DOI: 10.1021/acs.nanolett.6b01480

Source DB:  PubMed          Journal:  Nano Lett        ISSN: 1530-6984            Impact factor:   11.189


  3 in total

1.  Antiferroelectric negative capacitance from a structural phase transition in zirconia.

Authors:  Michael Hoffmann; Zheng Wang; Nujhat Tasneem; Ahmad Zubair; Prasanna Venkatesan Ravindran; Mengkun Tian; Anthony Arthur Gaskell; Dina Triyoso; Steven Consiglio; Kandabara Tapily; Robert Clark; Jae Hur; Sai Surya Kiran Pentapati; Sung Kyu Lim; Milan Dopita; Shimeng Yu; Winston Chern; Josh Kacher; Sebastian E Reyes-Lillo; Dimitri Antoniadis; Jayakanth Ravichandran; Stefan Slesazeck; Thomas Mikolajick; Asif Islam Khan
Journal:  Nat Commun       Date:  2022-03-09       Impact factor: 14.919

2.  Ultrathin ferroic HfO2-ZrO2 superlattice gate stack for advanced transistors.

Authors:  Suraj S Cheema; Nirmaan Shanker; Li-Chen Wang; Cheng-Hsiang Hsu; Shang-Lin Hsu; Yu-Hung Liao; Matthew San Jose; Jorge Gomez; Wriddhi Chakraborty; Wenshen Li; Jong-Ho Bae; Steve K Volkman; Daewoong Kwon; Yoonsoo Rho; Gianni Pinelli; Ravi Rastogi; Dominick Pipitone; Corey Stull; Matthew Cook; Brian Tyrrell; Vladimir A Stoica; Zhan Zhang; John W Freeland; Christopher J Tassone; Apurva Mehta; Ghazal Saheli; David Thompson; Dong Ik Suh; Won-Tae Koo; Kab-Jin Nam; Dong Jin Jung; Woo-Bin Song; Chung-Hsun Lin; Seunggeol Nam; Jinseong Heo; Narendra Parihar; Costas P Grigoropoulos; Padraic Shafer; Patrick Fay; Ramamoorthy Ramesh; Souvik Mahapatra; Jim Ciston; Suman Datta; Mohamed Mohamed; Chenming Hu; Sayeef Salahuddin
Journal:  Nature       Date:  2022-04-06       Impact factor: 69.504

Review 3.  Why Do Ferroelectrics Exhibit Negative Capacitance?

Authors:  Michael Hoffmann; Prasanna Venkatesan Ravindran; Asif Islam Khan
Journal:  Materials (Basel)       Date:  2019-11-13       Impact factor: 3.623

  3 in total

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