Literature DB >> 27183171

Directing Matter: Toward Atomic-Scale 3D Nanofabrication.

Stephen Jesse, Albina Y Borisevich, Jason D Fowlkes1, Andrew R Lupini, Philip D Rack1, Raymond R Unocic, Bobby G Sumpter, Sergei V Kalinin, Alex Belianinov, Olga S Ovchinnikova.   

Abstract

Enabling memristive, neuromorphic, and quantum-based computing as well as efficient mainstream energy storage and conversion technologies requires the next generation of materials customized at the atomic scale. This requires full control of atomic arrangement and bonding in three dimensions. The last two decades witnessed substantial industrial, academic, and government research efforts directed toward this goal through various lithographies and scanning-probe-based methods. These technologies emphasize 2D surface structures, with some limited 3D capability. Recently, a range of focused electron- and ion-based methods have demonstrated compelling alternative pathways to achieving atomically precise manufacturing of 3D structures in solids, liquids, and at interfaces. Electron and ion microscopies offer a platform that can simultaneously observe dynamic and static structures at the nano- and atomic scales and also induce structural rearrangements and chemical transformation. The addition of predictive modeling or rapid image analytics and feedback enables guiding these in a controlled manner. Here, we review the recent results that used focused electron and ion beams to create free-standing nanoscale 3D structures, radiolysis, and the fabrication potential with liquid precursors, epitaxial crystallization of amorphous oxides with atomic layer precision, as well as visualization and control of individual dopant motion within a 3D crystal lattice. These works lay the foundation for approaches to directing nanoscale level architectures and offer a potential roadmap to full 3D atomic control in materials. In this paper, we lay out the gaps that currently constrain the processing range of these platforms, reflect on indirect requirements, such as the integration of large-scale data analysis with theory, and discuss future prospects of these technologies.

Entities:  

Keywords:  atom dynamics; atomic manipulation; direct-write; helium ion microscopy; nanofabrication; nanolithography; scanning electron microscopy; scanning transmission electron microscopy

Year:  2016        PMID: 27183171     DOI: 10.1021/acsnano.6b02489

Source DB:  PubMed          Journal:  ACS Nano        ISSN: 1936-0851            Impact factor:   15.881


  15 in total

1.  Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment.

Authors:  Domagoj Belić; Mostafa M Shawrav; Emmerich Bertagnolli; Heinz D Wanzenboeck
Journal:  Beilstein J Nanotechnol       Date:  2017-11-29       Impact factor: 3.649

2.  Gas-assisted silver deposition with a focused electron beam.

Authors:  Luisa Berger; Katarzyna Madajska; Iwona B Szymanska; Katja Höflich; Mikhail N Polyakov; Jakub Jurczyk; Carlos Guerra-Nuñez; Ivo Utke
Journal:  Beilstein J Nanotechnol       Date:  2018-01-19       Impact factor: 3.649

3.  Modelling focused electron beam induced deposition beyond Langmuir adsorption.

Authors:  Dédalo Sanz-Hernández; Amalio Fernández-Pacheco
Journal:  Beilstein J Nanotechnol       Date:  2017-10-13       Impact factor: 3.649

4.  Electrochemical electron beam lithography: Write, read, and erase metallic nanocrystals on demand.

Authors:  Jeung Hun Park; Daniel A Steingart; Suneel Kodambaka; Frances M Ross
Journal:  Sci Adv       Date:  2017-07-12       Impact factor: 14.136

5.  Precision controlled atomic resolution scanning transmission electron microscopy using spiral scan pathways.

Authors:  Xiahan Sang; Andrew R Lupini; Jilai Ding; Sergei V Kalinin; Stephen Jesse; Raymond R Unocic
Journal:  Sci Rep       Date:  2017-03-08       Impact factor: 4.379

6.  Direct Write of 3D Nanoscale Mesh Objects with Platinum Precursor via Focused Helium Ion Beam Induced Deposition.

Authors:  Alex Belianinov; Matthew J Burch; Anton Ievlev; Songkil Kim; Michael G Stanford; Kyle Mahady; Brett B Lewis; Jason D Fowlkes; Philip D Rack; Olga S Ovchinnikova
Journal:  Micromachines (Basel)       Date:  2020-05-22       Impact factor: 2.891

7.  Multiscale simulation of the focused electron beam induced deposition process.

Authors:  Pablo de Vera; Martina Azzolini; Gennady Sushko; Isabel Abril; Rafael Garcia-Molina; Maurizio Dapor; Ilia A Solov'yov; Andrey V Solov'yov
Journal:  Sci Rep       Date:  2020-11-30       Impact factor: 4.379

8.  Room Temperature Direct Electron Beam Lithography in a Condensed Copper Carboxylate.

Authors:  Luisa Berger; Jakub Jurczyk; Katarzyna Madajska; Iwona B Szymańska; Patrik Hoffmann; Ivo Utke
Journal:  Micromachines (Basel)       Date:  2021-05-20       Impact factor: 2.891

9.  Chemical Changes in Layered Ferroelectric Semiconductors Induced by Helium Ion Beam.

Authors:  Alex Belianinov; Matthew J Burch; Holland E Hysmith; Anton V Ievlev; Vighter Iberi; Michael A Susner; Michael A McGuire; Peter Maksymovych; Marius Chyasnavichyus; Stephen Jesse; Olga S Ovchinnikova
Journal:  Sci Rep       Date:  2017-11-30       Impact factor: 4.379

10.  Towards the third dimension in direct electron beam writing of silver.

Authors:  Katja Höflich; Jakub Mateusz Jurczyk; Katarzyna Madajska; Maximilian Götz; Luisa Berger; Carlos Guerra-Nuñez; Caspar Haverkamp; Iwona Szymanska; Ivo Utke
Journal:  Beilstein J Nanotechnol       Date:  2018-03-08       Impact factor: 3.649

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