Assessing fabrication tolerances for a multilevel 2D binary grating for 3D multifocus microscopy.

We perform a comprehensive theoretical assessment of fabrication tolerances for a 2D eight-level binary phase grating that is the central element of a multi-focal plane 3D microscopy apparatus. The fabrication process encompasses a sequence of aligned lithography and etching steps with stringent requirements on layer-to-layer overlay, etch depth and etched sidewall slope, which we show are nonetheless achievable with state-of-the-art optical lithography and etching tools. We also perform broadband spectroscopic diffraction pattern measurements on a fabricated grating, and show how such measurements can be valuable in determining small fabrication errors in diffractive optical elements.