| Literature DB >> 27112352 |
Byung Suh Han1, Salim Caliskan2, Woonbae Sohn1, Miyoung Kim1, Jung-Kun Lee2, Ho Won Jang3.
Abstract
A facile approach to fabricate dye-sensitized solar cells (DSSCs) is demonstrated by depositing (001) oriented zinc oxide (ZnO) nanostructures on both glass and flexible substrates at room temperature using pulsed laser deposition. Unique crystallographic characteristics of ZnO combined with highly non-equilibrium state of pulsed laser-induced ablated species enabled highly crystalline ZnO nanostructures without aid of any chemically induced additives or organic/inorganic impurities at room temperature. Film morphology as well as internal surface area is tailored by varying ambient oxygen pressure and deposition time. It is revealed that the optimization of these two experimental factors was essential for achieving structure providing large surface area as well as efficient charge collection. The DSSCs with optimized ZnO photoanodes showed overall efficiencies of 3.89 and 3.4 % on glass and polyethylene naphthalate substrates, respectively, under AM 1.5G light illumination. The high conversion efficiencies are attributed to elongated electron lifetime and enhanced electrolyte diffusion in the high crystalline ZnO nanostructures, verified by intensity-modulated voltage spectroscopy and electrochemical impedance measurements.Entities:
Keywords: Dye-sensitized solar cell; Electron recombination; Pulsed laser deposition (PLD); Room temperature; Zinc oxide (ZnO)
Year: 2016 PMID: 27112352 PMCID: PMC4844570 DOI: 10.1186/s11671-016-1437-2
Source DB: PubMed Journal: Nanoscale Res Lett ISSN: 1556-276X Impact factor: 4.703
Fig. 1Cross-sectional and plane-view FESEM images of nanostructured ZnO photoanodes deposited under various ambient oxygen pressures on ITO/glass substrates. a, e 100 mTorr. b, f 200 mTorr, c, g 300 mTorr. d, h 400 mTorr
Fig. 2a XRD patterns of nanostructured ZnO photoanodes deposited on ITO/glass substrates as a function of the ambient oxygen pressure. The black line represents diffraction pattern of ITO substrate. Diffraction peaks of ITO are marked as asterisk. b High-magnification plane view SEM image of the ZnO photoanode deposited under 300 mTorr. c TEM image of the ZnO photoanode deposited under 300 mTorr. d High-resolution TEM image of the ZnO nanoparticle from the marked area in c. e Selective area electron diffraction pattern of the ZnO photoanode
Fig. 3a J–V curves of DSSCs fabricated with nanostructured ZnO photoanodes deposited under different ambient oxygen pressures. The thickness of the photoanodes was fixed to be 10 μm. b J–V curves of DSSCs fabricated with nanostructured ZnO photoanodes of different thicknesses. All photoanodes were deposited under oxygen pressure of 300 mTorr
Photovoltaic parameters of DSSCs with nanostructured ZnO photoanodes under simulated AM 1.5 G light illumination
| A | ||||
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| FF (%) |
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| 100 mTorr | 508 | 0.44 | 51 | 1.58 |
| 200 mTorr | 11.4 | 0.57 | 50 | 3.23 |
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| 400 mTorr | 12.7 | 0.53 | 51 | 3.41 |
| B | ||||
| 2.5 μm | 4.3 | 0.60 | 49 | 4.27 |
| 5.0 μm | 8.5 | 0.57 | 50 | 2.43 |
| 7.5 μm | 11 | 0.57 | 57 | 3.58 |
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| 15.0 μm | 13.7 | 0.56 | 50 | 3.86 |
| Flexible 10 μm | 10.8 | 0.55 | 57 | 3.4 |
J sc, V oc, FF, and η denote saturated photocurrent, open circuit voltage, fill factor, and overall efficiency, respectively
A as a function of ambient oxygen pressure for ZnO deposition (the thicknesses of all the ZnO films were fixed to be 10 μm)
B as function of film thickness (all films were deposited under 300 mTorr)
Fig. 4a Nyquist plots of DSSCs with nanostructured ZnO photoanodes deposited under different ambient oxygen pressures. The thickness of the photoanodes was fixed to be 10 μm. b Nyquist plots of DSSCs with nanostructured ZnO photoanodes of different thicknesses. All photoanodes were deposited under oxygen pressure of 300 mTorr. c Dark current characteristics of the DSSCs with nanostructured ZnO photoanodes of different thicknesses. d Short-circuit current density (J sc), the amount of dye loading, and the net efficiency for the DSSCs with nanostructured ZnO photoanodes of different thicknesses
Fig. 5Electron lifetime measured by IMVS as a function of the open circuit voltage for DSSCs fabricated with pulsed laser deposited (highly textured) and nanoparticle-based (randomly oriented) ZnO photoanodes
Fig. 6J–V relation of the DSSC with a nanostructured ZnO photoanode fabricated on a flexible ITO/PEN substrate. The insets show the (i) optical microscope image and high-magnification plane view FESEM image of a 10-μm-thick ZnO film grown at 300 mTorr on flexible ITO/PEN substrate and (ii) a photograph of the flexible DSSC