Yan-zhong Yang1, Xiao-hua Tian2, Xiao-feng Li2, Zheng-wei Gong2. 1. Department of VIP, Hangzhou Stomatological Hospital. Hangzhou 313000, Zhejiang Province,China. E-mail:15167134818@163.com. 2. Department of VIP, Hangzhou Stomatological Hospital. Hangzhou 313000, Zhejiang Province,China.
Abstract
PURPOSE: To evaluate the clinical results and technique of sinus membrane hydraulic elevation followed by bone graft and implant placement simultaneously. METHODS: Twenty-five patients were involved in the study (male:15, female: 10, age: 40-62 yrs). The mean residual ridge was (4.25±1.12) mm. Clinical examination were performed and radiographs were taken to evaluated the outcomes. RESULTS: The mean elevated height was (8.50±2.12) mm and 25 implants were placed. Only one implant was lost due to infection 3 weeks after operation because of diabetes. Only minor complications were observed postoperatively in the remaining patients. Twenty-four patients were satisfactorily restored with the follow-up period of 12-18 months. CONCLUSIONS: The technique of sinus membrane hydraulic elevation followed by bone graft and implant placement simultaneously displays minor complication, minimal discomfort and excellent success rate.
PURPOSE: To evaluate the clinical results and technique of sinus membrane hydraulic elevation followed by bone graft and implant placement simultaneously. METHODS: Twenty-five patients were involved in the study (male:15, female: 10, age: 40-62 yrs). The mean residual ridge was (4.25±1.12) mm. Clinical examination were performed and radiographs were taken to evaluated the outcomes. RESULTS: The mean elevated height was (8.50±2.12) mm and 25 implants were placed. Only one implant was lost due to infection 3 weeks after operation because of diabetes. Only minor complications were observed postoperatively in the remaining patients. Twenty-four patients were satisfactorily restored with the follow-up period of 12-18 months. CONCLUSIONS: The technique of sinus membrane hydraulic elevation followed by bone graft and implant placement simultaneously displays minor complication, minimal discomfort and excellent success rate.